SCHEMBL197167

SCHEMBL197167

CCCCCCCCCCCC(=O)OCC(C)(C)C=O

nearest known ligand 0.56

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
DGKA P23743 2/20 0.56
TSHR P16473 1/20 0.53
PAM P19021 2/20 0.51
MAPT P10636 1/20 0.49
LMNA P02545 4/20 0.47
DNM1 Q05193 1/20 0.47
ALDH1A1 P00352 1/20 0.47
KDM4E B2RXH2 1/20 0.46
DUSP3 P51452 1/20 0.46
MEN1 O00255 1/20 0.46
KMT2A Q03164 1/20 0.46
PRKCA P17252 1/20 0.44
PRKCE Q02156 1/20 0.44
PRKCQ Q04759 1/20 0.44
PRKCD Q05655 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9935881 1.00 DGKA (0.56) DGKATSHRPAMMAPTLMNA
SCHEMBL340251 1.00 DGKA (0.56) DGKATSHRPAMMAPTLMNA
SCHEMBL342390 1.00 DGKA (0.56) DGKATSHRPAMMAPTLMNA
SCHEMBL3110064 1.00 DGKA (0.56) DGKATSHRPAMMAPTLMNA
SCHEMBL341269 1.00 DGKA (0.56) DGKATSHRPAMMAPTLMNA
SCHEMBL1933672 1.00 DGKA (0.56) DGKATSHRPAMMAPTLMNA
SCHEMBL9935331 1.00 DGKA (0.56) DGKATSHRPAMMAPTLMNA
SCHEMBL2845569 0.98 DGKA (0.53) DGKATSHRPAMMAPTLMNA
SCHEMBL2847460 0.93 DGKA (0.46) DGKATSHRPAMMAPTLMNA
SCHEMBL4425044 0.93 DGKA (0.44) DGKATSHRPAMMAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 470 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117801592-A Asparagus polyurea coating adhesion promoter and preparation method and application thereof 深圳飞扬骏研新材料股份有限公司 2024-04-02 CN claimed
CN-116948504-A Epoxy modified oxazolidine, preparation method thereof and epoxy hybrid asparagus polyurea coating 深圳飞扬骏研新材料股份有限公司 2023-10-27 CN claimed
EP-2651875-B1 AMINES HAVING SECONDARY ALIPHATIC AMINO GROUPS SIKA TECH AG (CH) 2017-08-30 EP claimed
US-9290608-B2 Asymmetric dialdimine-containing polyurethane composition SIKA TECHNOLOGY AG (CH) 2016-03-22 US claimed
US-9290603-B2 Amines having secondary aliphatic amino groups SIKA TECHNOLOGY AG (CH) 2016-03-22 US claimed
US-20150232721-A1 MOISTURE-CURING HOT-MELT ADHESIVE COMPOUND CONTAINING POLYALDIMINE SIKA TECHNOLOGY AG (CH) 2015-08-20 US claimed
US-20140322531-A1 ASYMMETRIC DIALDIMINE-CONTAINING POLYURETHANE COMPOSITION SIKA TECHNOLOGY AG (CH) 2014-10-30 US claimed
US-8816037-B2 Asymmetric dialdimine-containing polyurethane composition SIKA TECHNOLOGY AG (CH) 2014-08-26 US claimed
US-8703844-B2 Low-viscosity epoxy resin composition with low blushing SIKA TECHNOLOGY AG (CH) 2014-04-22 US claimed
EP-2651875-A1 AMINES HAVING SECONDARY ALIPHATIC AMINO GROUPS Sika Technology AG (CH) 2013-10-23 EP claimed
US-20120270967-A1 LOW-VISCOSITY EPOXY RESIN COMPOSITION WITH LOW BLUSHING SIKA TECHNOLOGY AG (CH) 2012-10-25 US claimed
EP-2336213-B1 Low viscosity epoxide resin compound with low blushing SIKA TECHNOLOGY AG (CH) 2012-08-01 EP claimed
WO-2012080264-A1 AMINES HAVING SECONDARY ALIPHATIC AMINO GROUPS SIKA TECHNOLOGY AG (CH) 2012-06-21 WO claimed
EP-2465842-A1 Amines with secondary aliphatic amines Sika Technology AG (CH) 2012-06-20 EP claimed
EP-2336213-A1 Low viscosity epoxide resin compound with low blushing Sika Technology AG (CH) 2011-06-22 EP claimed
WO-2011069846-A1 LOW-VISCOSITY EPOXY RESIN COMPOSITION WITH LOW BLUSHING SIKA TECHNOLOGY AG (CH) 2011-06-16 WO claimed
US-20100130674-A1 METHOD FOR THE PRODUCTION OF POLYURETHANE COMPOSITIONS WITH A LOW ISOCYANATE MONOMER CONTENT SIKA TECHNOLOGY AG (CH) 2010-05-27 US claimed
EP-2132246-A1 METHOD FOR THE PRODUCTION OF POLYURETHANE COMPOSITIONS WITH A LOW ISOCYANATE MONOMER CONTENT Sika Technology AG (CH) 2009-12-16 EP claimed
WO-2008116927-A1 METHOD FOR THE PRODUCTION OF POLYURETHANE COMPOSITIONS WITH A LOW ISOCYANATE MONOMER CONTENT SIKA TECHNOLOGY AG (CH) 2008-10-02 WO claimed
EP-1975187-A1 Method for manufacturing polyurethane compounds with low isocyanate-monomer content Sika Technology AG (CH) 2008-10-01 EP claimed