SCHEMBL1973016

SCHEMBL1973016

[CH2]c1cccc2ccc3ccccc3c12

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 8/20 0.54
ALDH1A1 P00352 8/20 0.54
CYP1A2 P05177 7/20 0.54
HPGD P15428 5/20 0.54
THRB P10828 1/20 0.54
TSHR P16473 6/20 0.50
CYP2A6 P11509 5/20 0.50
TDP1 Q9NUW8 2/20 0.50
HPRT1 P00492 1/20 0.46
CYP3A4 P08684 4/20 0.46
CYP1B1 Q16678 2/20 0.46
CYP1A1 P04798 1/20 0.46
L3MBTL1 Q9Y468 3/20 0.43
HIF1A Q16665 2/20 0.43
MAPK1 P28482 2/20 0.43
ATM Q13315 2/20 0.43
MAOA P21397 2/20 0.43
ERBB2 P04626 1/20 0.43
FYN P06241 1/20 0.43
ACHE P22303 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6521617 0.80 CYP1A2 (0.48) HSD17B10ALDH1A1CYP1A2HPGDTHRB
SCHEMBL3074 0.79 ALDH1A1 (0.53) HSD17B10ALDH1A1CYP1A2HPGDTHRB
SCHEMBL29388002 0.79 HSD17B10 (0.69) HSD17B10ALDH1A1CYP1A2HPGDTHRB
SCHEMBL29613365 0.79 HSD17B10 (0.72) HSD17B10ALDH1A1CYP1A2HPGDTHRB
SCHEMBL9171706 0.79 ALDH1A1 (0.53) HSD17B10ALDH1A1CYP1A2HPGDTHRB
SCHEMBL535472 0.79 HSD17B10 (0.72) HSD17B10ALDH1A1CYP1A2HPGDTHRB
SCHEMBL29487823 0.79 HSD17B10 (0.72) HSD17B10ALDH1A1CYP1A2HPGDTHRB
SCHEMBL30374792 0.79 HSD17B10 (0.69) HSD17B10ALDH1A1CYP1A2HPGDTHRB
SCHEMBL535635 0.79 HSD17B10 (0.69) HSD17B10ALDH1A1CYP1A2HPGDTHRB
SCHEMBL29026281 0.77 ALDH1A1 (0.50) HSD17B10ALDH1A1CYP1A2HPGDTHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4214247-A1 COMPOSITION COMPRISING ADDITIVE HAVING A POLYCYCLIC AROMATIC GROUP E Ink Corporation (US) 2023-07-26 EP disclosed
US-10640462-B2 Oil gelator NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY (JP) 2020-05-05 US disclosed
EP-3524656-A1 NOVEL HYDROGELATOR National University Corporation Shizuoka University (JP) 2019-08-14 EP disclosed
US-20190241598-A1 NOVEL HYDROGELATOR NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY (JP) 2019-08-08 US disclosed
CN-109790439-A New hydrogel agent 国立大学法人静冈大学 2019-05-21 CN disclosed
US-10289002-B2 Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymer NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2019-05-14 US disclosed
US-20180362454-A1 OIL GELATOR NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY (JP) 2018-12-20 US disclosed
EP-3381995-A1 OIL-GELLING AGENT National University Corporation Shizuoka University (JP) 2018-10-03 EP disclosed
US-10042247-B2 Mask blank, method for manufacturing mask blank and transfer mask HOYA CORPORATION (JP) 2018-08-07 US disclosed
CN-108368414-A Oily gelling agent 国立大学法人静冈大学 2018-08-03 CN disclosed
EP-2336256-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM WITH ONIUM GROUP Nissan Chemical Industries, Ltd. (JP) 2011-06-22 EP disclosed
US-20110143149-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2011-06-16 US disclosed
US-7842620-B2 Method for manufacturing semiconductor device using quadruple-layer laminate NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-11-30 US disclosed
US-20100291483-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING BRANCHED POLYHYDROXYSTYRENE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-11-18 US disclosed
US-20100075253-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LOW MOLECULAR WEIGHT DISSOLUTION ACCELERATOR NISSAN CHEMICAL INDUSTRIES , LTD. (JP) 2010-03-25 US disclosed
US-20100022089-A1 Method for manufacturing semiconductor device using quadruple-layer laminate NISSIAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-28 US disclosed
CN-101558358-A Resist underlayer film forming composition containing low molecular weight dissolution promoter NISSAN CHEMICAL IND LTD (JP) 2009-10-14 CN disclosed
CN-101523292-A Method for manufacturing semiconductor device using quadruple-layer laminate NISSAN CHEMICAL IND LTD (JP) 2009-09-02 CN disclosed
EP-2085823-A1 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING QUADRUPLE-LAYER LAMINATE Nissan Chemical Industries, Ltd. (JP) 2009-08-05 EP disclosed
US-6248918-B1 BIS(DIHYDROCARBYLPHOSPHINOYLALKYL)-1,1'-BINAPHTHOL) AND RARE EARTH OR GROUP 3A METAL SALTS NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2001-06-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20190241598-A1 NOVEL HYDROGELATOR AGL, GCK, CCNL2 HSD17B10 1520/4885ALDH1A1 653/4885CYP1A2 3681/4885
US-10640462-B2 Oil gelator MGLL, CCNL2, CCNI HSD17B10 204/4885ALDH1A1 593/4885CYP1A2 190/4885
US-20110143149-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP SRR, KDM2B, MSR1 HSD17B10 2244/4885ALDH1A1 3585/4885CYP1A2 2593/4885
US-20180362454-A1 OIL GELATOR MGLL, CCNL2, CCNI HSD17B10 204/4885ALDH1A1 593/4885CYP1A2 190/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.