Pyridine

Pyridine

SCHEMBL19742951

O=S(=O)(O)c1ccccc1S(=O)(=O)O.c1ccncc1.c1ccncc1

nearest known ligand 0.47

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NAPRT Q6XQN6 2/20 0.47
TSHR P16473 2/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
MYC P01106 1/20 0.41
TDP1 Q9NUW8 2/20 0.41
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
TTR P02766 2/20 0.40
FABP4 P15090 1/20 0.40
CCNA2 P20248 1/20 0.40
CDK2 P24941 1/20 0.40
MAPK14 Q16539 1/20 0.40
NR4A1 P22736 1/20 0.39
COMT P21964 1/20 0.38
L3MBTL1 Q9Y468 2/20 0.37
NOTUM Q6P988 1/20 0.37
NFE2L2 Q16236 2/20 0.37
CHAT P28329 1/20 0.37
SNCA P37840 1/20 0.37
CYP2D6 P10635 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzoic Acid SCHEMBL28165807 0.89 NAPRT (0.50) NAPRTTSHRMEN1KMT2ACYP2D6
Phenolsulphonic Acid SCHEMBL19514118 0.88 NAPRT (0.41) NAPRTTSHRSMN1; SMN2MYCTDP1
Pyridine SCHEMBL251401 0.86 TDP1 (0.47) NAPRTTSHRSMN1; SMN2MYCTDP1
Phenolsulfonic Acid SCHEMBL28165599 0.86 LMNA (0.57) NAPRTTSHRSMN1; SMN2TDP1L3MBTL1
Pyridine SCHEMBL28150876 0.85 TDP1 (0.46) NAPRTTSHRSMN1; SMN2MYCTDP1
Pyridine SCHEMBL28284596 0.83 TDP1 (0.49) NAPRTSMN1; SMN2MYCTDP1L3MBTL1
Pyridine SCHEMBL1270544 0.83 CA1 (0.50) TSHRMEN1KMT2ATTRFABP4
Pyridine SCHEMBL1270547 0.83 CA1 (0.50) TSHRMEN1KMT2ATTRFABP4
SCHEMBL29664068 0.83 TSHR (0.55) TSHRSMN1; SMN2MYCTDP1TTR
SCHEMBL150335 0.83 TSHR (0.55) TSHRSMN1; SMN2MYCTDP1TTR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11815815-B2 Composition for forming silicon-containing resist underlayer film removable by wet process NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2023-11-14 US disclosed
US-20170371242-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM REMOVABLE BY WET PROCESS NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-12-28 US disclosed