SCHEMBL19756089

SCHEMBL19756089

O=C(OCCS(=O)(=O)O)c1c(I)c(I)c(I)c(I)c1C(=O)OC1CCCC1

nearest known ligand 0.35

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
▸ STS P08842 4/20 0.35
▸ MMP1 P03956 1/20 0.30
▸ MMP9 P14780 1/20 0.30
▸ MMP12 P39900 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19756090 0.99 STS (0.36) STSMMP1MMP9MMP12
SCHEMBL25476274 0.82 STS (0.33) STSMMP9MMP12
SCHEMBL19756067 0.81 — —
SCHEMBL25476275 0.81 STS (0.34) STSMMP1MMP9MMP12
SCHEMBL19756108 0.80 — —
SCHEMBL19756102 0.78 — —
SCHEMBL25913783 0.77 STS (0.30) STS
SCHEMBL25528050 0.77 STS (0.30) STS
SCHEMBL19756104 0.77 ALDH1A1 (0.39) —
SCHEMBL19756085 0.77 RAB9A (0.33) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230273519-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD JSR CORPORATION (JP) 2023-08-31 — — US disclosed
US-20170369616-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-12-28 — — US disclosed
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