SCHEMBL19760409

SCHEMBL19760409

CC(c1ccccc1)c1cc(C(C)c2ccccc2)c(OCCOCCOCCOCCOCCOCCO)c(C(C)c2ccccc2)c1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TYR P14679 1/20 0.38
HTR2A P28223 3/20 0.36
HTR7 P34969 3/20 0.36
ADRA1A P35348 2/20 0.36
HTR6 P50406 2/20 0.36
USP2 O75604 2/20 0.36
ABCB11 O95342 1/20 0.36
CHRM2 P08172 1/20 0.36
ADRA2A P08913 1/20 0.36
DRD2 P14416 1/20 0.36
ADRA2B P18089 1/20 0.36
ADRA2C P18825 1/20 0.36
DRD4 P21917 1/20 0.36
HRH2 P25021 1/20 0.36
HRH1 P35367 1/20 0.36
DRD3 P35462 1/20 0.36
OPRK1 P41145 1/20 0.36
HTR2B P41595 1/20 0.36
HTR5A P47898 1/20 0.36
KCNH2 Q12809 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1618270 0.91 ALDH1A1 (0.42) TYRALDH1A1RECQLMEN1KMT2A
SCHEMBL16021965 0.84 ALDH1A1 (0.36) TYRHTR2AHTR7ADRA1AHTR6
SCHEMBL14768630 0.83 ALDH1A1 (0.34) TYRALDH1A1L3MBTL1MEN1KMT2A
SCHEMBL13875587 0.83 ALDH1A1 (0.43) USP2ALDH1A1RECQLMEN1KMT2A
SCHEMBL27396377 0.82 TYR (0.38) TYRALDH1A1MEN1KMT2AMAPK1
SCHEMBL20090508 0.82 ALDH1A1 (0.39) TYRALDH1A1RECQLHTR1AL3MBTL1
SCHEMBL21894643 0.82 ANPEP (0.36) TYRALDH1A1MEN1KMT2ALMNA
SCHEMBL29336019 0.82 TYR (0.32) TYRHTR2AHTR7ADRA1AHTR6
SCHEMBL14444135 0.81 TYR (0.39) TYRLMNAMAPTSCN8ASMN1; SMN2
SCHEMBL15831118 0.80 THRB (0.40) TYRALDH1A1MEN1KMT2ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180002541-A1 Compositions Including a High Molecular Weight Acid Suitable for Conductive Polymer Formation on Dielectric Substrate MACDERMID ENTHONE INC (US) 2018-01-04 US disclosed