SCHEMBL197671

SCHEMBL197671

FC(F)(F)c1ccccc1-c1ccccc1C(F)(F)F

nearest known ligand 0.56

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 5/20 0.56
NOTUM Q6P988 2/20 0.52
ALDH1A1 P00352 3/20 0.48
CYP3A4 P08684 2/20 0.48
CYP2D6 P10635 2/20 0.48
ALOX15 P16050 2/20 0.48
CYP2C19 P33261 2/20 0.48
HSD17B10 Q99714 2/20 0.48
MAPK1 P28482 1/20 0.48
HPGD P15428 1/20 0.48
AR P10275 1/20 0.48
TRPA1 O75762 3/20 0.47
PSMB8 P28062 1/20 0.47
TDP1 Q9NUW8 2/20 0.46
POLB P06746 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
CYP1A2 P05177 1/20 0.46
TRPM8 Q7Z2W7 1/20 0.46
TRPV1 Q8NER1 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL29010139 0.97 HSD11B1 (0.54) HSD11B1NOTUMALDH1A1CYP3A4CYP2D6
SCHEMBL8022901 0.97 HSD11B1 (0.54) HSD11B1NOTUMALDH1A1CYP3A4CYP2D6
SCHEMBL30977284 0.87 HSD11B1 (0.47) HSD11B1NOTUMALDH1A1CYP3A4CYP2D6
SCHEMBL27925987 0.87 KCNN4 (0.49) HSD11B1NOTUMALDH1A1CYP3A4CYP2D6
SCHEMBL22304414 0.86 AR (0.58) HSD11B1NOTUMALDH1A1CYP3A4CYP2D6
SCHEMBL2492272 0.85 HSD11B1 (0.46) HSD11B1NOTUMALDH1A1CYP3A4CYP2D6
SCHEMBL5541462 0.85 HSD11B1 (0.55) HSD11B1NOTUMALDH1A1CYP3A4CYP2D6
SCHEMBL20472968 0.85 ALDH1A1 (0.49) HSD11B1NOTUMALDH1A1CYP3A4CYP2D6
SCHEMBL1262778 0.85 HSD11B1 (0.59) HSD11B1NOTUMALDH1A1CYP3A4CYP2D6
SCHEMBL5109985 0.85 HSD11B1 (0.51) HSD11B1NOTUMALDH1A1CYP3A4CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 158 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116479659-B Polyamide imide-polyaniline composite conductive fiber membrane with high glass transition temperature and preparation method thereof 浙江大学 2024-05-24 CN claimed
CN-116479659-A Polyamide imide-polyaniline composite conductive fiber membrane with high glass transition temperature and preparation method thereof 浙江大学 2023-07-25 CN claimed
CN-116003793-A Polyamide-imide film and preparation method thereof 株洲时代华昇新材料技术有限公司 2023-04-25 CN claimed
CN-113150545-B Polymer film containing nano fullerene and preparation method thereof 北京市科学技术研究院分析测试研究所(北京市理化分析测试中心) 2022-11-15 CN claimed
CN-114685786-A Polyimide film and preparation method and application thereof 中国科学院化学研究所 2022-07-01 CN claimed
CN-114685986-A Polyimide film and preparation method and application thereof 中国科学院化学研究所 2022-07-01 CN claimed
CN-106699709-A Preparation method of 2,2'-bis (trifluoromethyl)-4,4',5,5'-diphenyl dianhydride 江苏尚莱特医药化工材料有限公司 2017-05-24 CN claimed
CN-104211944-B Multi-fluorine polyarylether, preparation method and application thereof 中国科学院上海有机化学研究所 2017-01-18 CN claimed
CN-104211944-A Multi-fluorine polyarylether, preparation method and application thereof SHANGHAI INST ORGANIC CHEM 2014-12-17 CN claimed
US-20100036167-A1 PROCESS FOR PRODUCTION OF 2,2'-BIS(TRIFLUOROMETHYL)-4,4'-DIAMINOBIPHENYL TORAY FINE CHEMICALS CO., LTD. (JP) 2010-02-11 US claimed
EP-2100874-A1 PROCESS FOR PRODUCTION OF 2,2'-BIS(TRIFLUOROMETHYL)- 4,4'-DIAMINOBIPHENYL Toray Fine Chemicals Co., Ltd. (JP) 2009-09-16 EP claimed
EP-2027184-A2 HYDROPHOBIC COMPOSITIONS FOR ELECTRONIC APPLICATIONS E.I. DU PONT DE NEMOURS AND COMPANY (US) 2009-02-25 EP claimed
WO-2007146382-A2 HYDROPHOBIC COMPOSITIONS FOR ELECTRONIC APPLICATIONS E. I. DU PONT DE NEMOURS AND COMPANY (US) 2007-12-21 WO claimed
EP-1089129-B1 Positive type photosensitive resin composition, process for producing pattern and electronic parts HITACHI CHEM DUPONT MICROSYS (JP) 2007-06-13 EP claimed
US-6436593-B1 A POLYIMIDE PRECURSOR OR A POLYOXAZOLE PRECURSOR HAVING A GROUP REPRESENTED BY--OR, ACID GENERATION WITH RADIATION HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) 2002-08-20 US claimed
EP-1089129-A1 Positive type photosensitive resin composition, process for producing pattern and electronic parts Hitachi Chemical DuPont MicroSystems Ltd. (JP) 2001-04-04 EP claimed
CN-121949060-A Preparation method of 2,2' -bis (trifluoromethyl) biphenyl 浙江巍华新材料股份有限公司 2026-05-01 CN disclosed
CN-121949060-A Preparation method of 2,2' -bis (trifluoromethyl) biphenyl 浙江巍华新材料股份有限公司 2026-05-01 CN disclosed
EP-0869151-A2 Thermosetting resin composition NITTO DENKO CORPORATION (JP) 1998-10-07 EP disclosed
EP-0810244-A2 Aromatic polycarbodiimide and sheet using it NITTO DENKO CORPORATION (JP) 1997-12-03 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100036167-A1 PROCESS FOR PRODUCTION OF 2,2'-BIS(TRIFLUOROMETHYL)-4,4'-DIAMINOBIPHENYL DDT, DBF4, CYP4B1 HSD11B1 2225/4885NOTUM 1406/4885ALDH1A1 701/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.