SCHEMBL1978240

SCHEMBL1978240

C=CC(O)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8524325 0.93 THRB (0.33)
SCHEMBL331862 0.79
SCHEMBL16595147 0.79
SCHEMBL12231853 0.79 ALDH1A1 (0.42)
SCHEMBL23694376 0.77 ALDH1A1 (0.41)
Ether SCHEMBL7157288 0.77 CA1 (0.35)
SCHEMBL13434448 0.75
SCHEMBL22562174 0.74
SCHEMBL5208775 0.74 DNM1 (0.41)
SCHEMBL23027302 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105643184-B The repair method of ring flange in a kind of X-ray emitter 中国化学工程第三建设有限公司 2017-12-12 CN claimed
CN-105643184-A Method for repairing flange plates in X-ray generators 中国化学工程第三建设有限公司 2016-06-08 CN claimed
CN-103132067-B Pre-treating agent for surfaces of aluminum profile and aluminum alloy profile WUHAN FENGFAN ELECTROPLATING TECHNOLOGY CO LTD 2015-03-04 CN claimed
CN-103993303-A Trivalent-chromium anticorrosive passivating solution of aluminium and aluminium alloy WUHAN FENGFAN ELECTROPLATING TECHNOLOGY CO LTD 2014-08-20 CN claimed
CN-103993304-A Trivalent-chromium pretreatment solution for aluminium and aluminium alloy WUHAN FENGFAN ELECTROPLATING TECHNOLOGY CO LTD 2014-08-20 CN claimed
CN-103132067-A Pre-treating agent for surfaces of aluminum profile and aluminum alloy profile WUHAN FENGFAN ELECTROPLATING TECHNOLOGY CO LTD 2013-06-05 CN claimed
US-20180180992-A1 Chemically Amplified Positive Resist Composition and Resist Pattern Forming Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-28 US disclosed
CN-105643184-B The repair method of ring flange in a kind of X-ray emitter 中国化学工程第三建设有限公司 2017-12-12 CN disclosed
US-9638849-B2 Liquid crystal compound, optical film, and method for producing optical film FUJIFILM CORPORATION (JP) 2017-05-02 US disclosed
US-20170003643-A1 CLEANING BLADE, PROCESS CARTRIDGE, AND IMAGE FORMING APPARATUS RICOH COMPANY, LTD. (JP) 2017-01-05 US disclosed
CN-105643184-A Method for repairing flange plates in X-ray generators 中国化学工程第三建设有限公司 2016-06-08 CN disclosed
US-20150277007-A1 LIQUID CRYSTAL COMPOUND, OPTICAL FILM, AND METHOD FOR PRODUCING OPTICAL FILM FUJIFILM CORPORATION (JP) 2015-10-01 US disclosed
CN-103132067-B Pre-treating agent for surfaces of aluminum profile and aluminum alloy profile WUHAN FENGFAN ELECTROPLATING TECHNOLOGY CO LTD 2015-03-04 CN disclosed
EP-1343933-B1 SILOXANE DRY CLEANING COMPOSITION AND PROCESS GEN ELECTRIC (US) 2007-05-16 EP disclosed
CN-1863843-A Carbinol functional silicone resins DOW CORNING (US) 2006-11-15 CN disclosed
US-20060235142-A1 Carbinol functional silicone resins DOW CORNING CORPORATION 2006-10-19 US disclosed
EP-1687358-A1 CARBINOL-FUNCTION SILICINE RESINS Dow Corning Corporation (US) 2006-08-09 EP disclosed
WO-2005037891-A1 CARBINOL-FUNCTION SILICINE RESINS DOW CORNING CORPORATION (US) 2005-04-28 WO disclosed
US-6548465-B2 Volatile siloxane, an aminofunctional siloxane and water or acid GENERAL ELECTRIC COMPANY 2003-04-15 US disclosed
US-6297331-B1 ETHYL HYDROXYALKYL ETHER ATTACHED VIA CARBON TO SILICON, INTERMEDIATES FOR THE PREPARATION OF SILICONE POLYETHERS, POLYESTERS, POLYURETHANES, ACRYLATES AND SILICONE ISOCYANATES. DIRT-REPELLENT COATINGS. ANTI-GRAFFITI TH. GOLDSCHMIDT AG (DE) 2001-10-02 US disclosed