Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HRH3 | Q9Y5N1 | 3/20 | 0.41 |
| ▸ | ESR1 | P03372 | 4/20 | 0.39 |
| ▸ | ESR2 | Q92731 | 4/20 | 0.39 |
| ▸ | DRD2 | P14416 | 1/20 | 0.38 |
| ▸ | OPRM1 | P35372 | 4/20 | 0.37 |
| ▸ | OPRL1 | P41146 | 4/20 | 0.37 |
| ▸ | OPRK1 | P41145 | 3/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.33 |
| ▸ | SLC18A3 | Q16572 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10602015 | 0.86 | ESR1 (0.42) | ESR1ESR2ALDH1A1L3MBTL1 | |
| SCHEMBL17914393 | 0.85 | MEN1 (0.35) | HRH3ESR1ESR2DRD2OPRM1 | |
| SCHEMBL893223 | 0.80 | OPRM1 (0.53) | HRH3ESR1ESR2DRD2OPRM1 | |
| SCHEMBL1516123 | 0.80 | ESR2 (0.61) | ESR1ESR2OPRM1ALDH1A1MEN1 | |
| SCHEMBL11962271 | 0.77 | OPRM1 (0.55) | HRH3ESR1ESR2DRD2OPRM1 | |
| SCHEMBL4987796 | 0.77 | KMT2A (0.41) | ESR1ESR2ALDH1A1L3MBTL1KMT2A | |
| SCHEMBL5241008 | 0.77 | ESR2 (0.60) | ESR1ESR2OPRM1ALDH1A1MEN1 | |
| SCHEMBL6752708 | 0.77 | ESR1 (0.64) | HRH3ESR1ESR2DRD2OPRM1 | |
| SCHEMBL6058583 | 0.77 | ESR1 (0.64) | HRH3ESR1ESR2DRD2OPRM1 | |
| SCHEMBL24845287 | 0.77 | DRD2 (0.43) | HRH3ESR1ESR2DRD2OPRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9874816-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2018-01-23 | — | — | US | disclosed |