SCHEMBL19795481

SCHEMBL19795481

CC(C)COc1cc(F)c(F)c(F)c1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 3/20 0.40
MAOA P21397 3/20 0.40
ALDH1A1 P00352 4/20 0.37
GAA P10253 1/20 0.37
PDK2 Q15119 1/20 0.36
LMNA P02545 2/20 0.36
MAPT P10636 3/20 0.36
HPGD P15428 3/20 0.36
POLB P06746 2/20 0.36
XBP1 P17861 1/20 0.36
PARP14 Q460N5 1/20 0.36
FFAR4 Q5NUL3 1/20 0.35
KAT6A Q92794 1/20 0.35
PLA2G7 Q13093 1/20 0.35
KDM4E B2RXH2 3/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35
NPC1 O15118 1/20 0.34
TSHR P16473 1/20 0.34
RAB9A P51151 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15985645 0.87 MAOA (0.39) MAOBMAOAALDH1A1GAAPDK2
SCHEMBL13647258 0.82 FFAR4 (0.44) MAOBMAOAALDH1A1GAAPDK2
SCHEMBL4737611 0.80 MAPT (0.46) MAOBMAOAALDH1A1GAAPDK2
SCHEMBL14363223 0.78 FFAR1 (0.45) MAOBMAOAALDH1A1PDK2LMNA
SCHEMBL22114301 0.77 MAPT (0.38) MAOBMAOAALDH1A1GAAPDK2
SCHEMBL19962880 0.77 SLC6A4 (0.43) MAOBMAOAALDH1A1GAAPDK2
SCHEMBL17164324 0.77 ALDH1A1 (0.35) MAOBMAOAALDH1A1GAAMAPT
SCHEMBL20791990 0.77 MAOA (0.44) MAOBMAOAPDK2LMNAMAPT
SCHEMBL15710186 0.76 NQO1 (0.48) MAOBMAPTCYP2C19NPC1TSHR
SCHEMBL17662615 0.75 FFAR4 (0.40) MAOBMAOAALDH1A1GAAPDK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230350294-A1 Negative Photosensitive Resin Composition, Patterning Process, Interlayer Insulating Film, Surface Protection Film, And Electronic Component SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-02 US disclosed
US-11768434-B2 Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-26 US disclosed
US-20180024434-A1 TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-01-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180024434-A1 TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM F12, RTF1, PUF60 MAOB 3614/4885MAOA 3519/4885ALDH1A1 2329/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.