SCHEMBL19822476

SCHEMBL19822476

CO[Si](CCCNC(=S)Nc1ccc2cc3ccccc3cc2c1)(OC)OC

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 7/20 0.51
▸ LMNA P02545 4/20 0.51
▸ SMN1; SMN2 Q16637 2/20 0.51
▸ NPC1 O15118 1/20 0.50
▸ RAB9A P51151 1/20 0.50
▸ MAPT P10636 6/20 0.48
▸ GAA P10253 3/20 0.48
▸ QPCT Q16769 2/20 0.47
▸ KMT2A Q03164 4/20 0.47
▸ KDM4E B2RXH2 3/20 0.47
▸ HTT P42858 3/20 0.47
▸ NPSR1 Q6W5P4 1/20 0.47
▸ MEN1 O00255 3/20 0.46
▸ ALPL P05186 2/20 0.46
▸ ALOX12 P18054 2/20 0.46
▸ RECQL P46063 1/20 0.46
▸ PABPC1 P11940 1/20 0.45
▸ TDP1 Q9NUW8 1/20 0.45
▸ HPGD P15428 1/20 0.45
▸ QPCTL Q9NXS2 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19822472 0.96 NPC1 (0.54) ALDH1A1LMNASMN1; SMN2NPC1RAB9A
SCHEMBL19822481 0.83 ALDH1A1 (0.59) ALDH1A1LMNASMN1; SMN2NPC1RAB9A
SCHEMBL19828146 0.79 PPARG (0.41) ALDH1A1LMNASMN1; SMN2NPC1RAB9A
SCHEMBL19822465 0.76 QPCT (0.52) ALDH1A1LMNASMN1; SMN2GAAQPCT
SCHEMBL19822466 0.74 BCL6 (0.59) ALDH1A1GAAKMT2AKDM4EMEN1
SCHEMBL10312316 0.73 EPHX1 (0.62) ALDH1A1LMNASMN1; SMN2NPC1RAB9A
SCHEMBL19822471 0.73 POLB (0.69) ALDH1A1LMNASMN1; SMN2NPC1RAB9A
SCHEMBL19822473 0.71 ALDH1A1 (0.43) ALDH1A1LMNASMN1; SMN2RAB9AMAPT
SCHEMBL19827963 0.71 GAA (0.47) ALDH1A1LMNAMAPTGAAKMT2A
SCHEMBL19822485 0.71 NPC1 (0.46) ALDH1A1LMNASMN1; SMN2NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10365559-B2 Photosensitive resin composition, method for manufacturing cured resin film, and semiconductor device TORAY INDUSTRIES, INC. (JP) 2019-07-30 — — US disclosed
US-20180203353-A1 CURED FILM AND METHOD FOR MANUFACTURING SAME TORAY INDUSTRIES, INC. (JP) 2018-07-19 — — US disclosed
US-20180066107-A1 PHOTOSENSITIVE RESIN COMPOSITION TORAY INDUSTRIES, INC. (JP) 2018-03-08 — — US disclosed
US-20180031970-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RESIN FILM, AND SEMICONDUCTOR DEVICE TORAY INDUSTRIES, INC. (JP) 2018-02-01 — — US disclosed
US-20180031970-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RESIN FILM, AND SEMICONDUCTOR DEVICE TORAY INDUSTRIES, INC. (JP) 2018-02-01 — — US disclosed
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