SCHEMBL3414722

SCHEMBL3414722

CC(=O)OC1CC2CC1C1C3CC(C21)[C@H](C)C3

nearest known ligand 0.40

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CHRM2 P08172 7/20 0.37
CHRM1 P11229 5/20 0.37
CYP2D6 P10635 2/20 0.37
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
CHRM4 P08173 4/20 0.34
CHRM3 P20309 4/20 0.34
TSHR P16473 1/20 0.33
TDP1 Q9NUW8 1/20 0.31
CHRM5 P08912 2/20 0.31
CYP2C19 P33261 1/20 0.31
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10199946 1.00 CHRM2 (0.37) CHRM2CHRM1CYP2D6MEN1KMT2A
SCHEMBL9965125 1.00 CHRM2 (0.37) CHRM2CHRM1CYP2D6MEN1KMT2A
SCHEMBL23633756 0.85 GPX4 (0.32)
SCHEMBL12270976 0.84 CHRM2 (0.36) CHRM2CHRM1CYP2D6MEN1KMT2A
SCHEMBL23633736 0.82
SCHEMBL15147014 0.81 CHRM2 (0.41) CHRM2CHRM1CYP2D6MEN1KMT2A
SCHEMBL14355803 0.81 GPX4 (0.30)
SCHEMBL12430188 0.81 CHRM2 (0.34) CHRM2CHRM1CYP2D6MEN1KMT2A
SCHEMBL19829285 0.81 CHRM2 (0.38) CHRM2CHRM1CYP2D6MEN1KMT2A
SCHEMBL23633724 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 68 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9115074-B2 Fluorinated monomer, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-08-25 US disclosed
US-9115074-B2 Fluorinated monomer, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-08-25 US disclosed
US-9086628-B2 Resist protective film-forming composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-21 US disclosed
US-8945809-B2 Fluorinated monomer, fluorinated polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-03 US disclosed
US-8945809-B2 Fluorinated monomer, fluorinated polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-03 US disclosed
US-8933251-B2 Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-01-13 US disclosed
US-8933251-B2 Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-01-13 US disclosed
US-8916331-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-23 US disclosed
US-8916331-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-23 US disclosed
US-20140114080-A1 FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-24 US disclosed
US-7488567-B2 Polymer, resist composition and patterning process PANASONIC CORPORATION (JP) 2009-02-10 US disclosed
US-7488567-B2 Polymer, resist composition and patterning process PANASONIC CORPORATION (JP) 2009-02-10 US disclosed
US-7378218-B2 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-05-27 US disclosed
US-20080118860-A1 Polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-05-22 US disclosed
US-20080118860-A1 Polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-05-22 US disclosed
US-20080090173-A1 POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. 2008-04-17 US disclosed
US-20080090173-A1 POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. 2008-04-17 US disclosed
US-20080085466-A1 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-04-10 US disclosed
EP-1652846-B1 Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2007-08-22 EP disclosed
US-20070128555-A1 Novel ester compound, polymer, resist composition, and patterning process CENTRAL GLASS CO., LTD. 2007-06-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20140114080-A1 FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS H1-0, FRG1, H1-3 CHRM2 413/4885CHRM1 155/4885CYP2D6 3097/4885
US-20070128555-A1 Novel ester compound, polymer, resist composition, and patterning process C9, RER1, ARF1 CHRM2 2458/4885CHRM1 2419/4885CYP2D6 3750/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.