SCHEMBL19829484

SCHEMBL19829484

c1ccc(-c2ccccc2OC2CCCCC2)c(OC2CCCCC2)c1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HRH1 P35367 1/20 0.55
PDE4A P27815 2/20 0.51
PDE4B Q07343 2/20 0.51
PDE4C Q08493 2/20 0.51
PDE4D Q08499 2/20 0.51
PDE5A O76074 1/20 0.51
MCHR1 Q99705 2/20 0.47
CARM1 Q86X55 3/20 0.45
PRMT1 Q99873 3/20 0.45
PDK2 Q15119 2/20 0.41
CSNK2A1 P68400 2/20 0.39
HTR1A P08908 1/20 0.39
SLC6A2 P23975 1/20 0.39
SLC6A3 Q01959 1/20 0.39
F2 P00734 1/20 0.38
F10 P00742 1/20 0.38
PLG P00747 1/20 0.38
PLAU P00749 1/20 0.38
PLAT P00750 1/20 0.38
HPGD P15428 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2242864 0.89 MCHR1 (0.51) HRH1PDE4APDE4BPDE4CPDE4D
SCHEMBL5344402 0.86 MCHR1 (0.49) HRH1PDE4APDE4BPDE4CPDE4D
SCHEMBL10605456 0.83 MCHR1 (0.51) HRH1PDE4APDE4BPDE4CPDE4D
SCHEMBL6100016 0.81 HRH1 (0.54) HRH1PDE4APDE4BPDE4CPDE4D
SCHEMBL7059946 0.80 MCHR1 (0.54) PDE4APDE4BPDE4CPDE4DPDE5A
SCHEMBL16789532 0.80 MCHR1 (0.54) PDE4APDE4BPDE4CPDE4DPDE5A
SCHEMBL24806043 0.79 PDE4A (0.53) PDE4APDE4BPDE4CPDE4DCARM1
SCHEMBL5338230 0.79 MCHR1 (0.45) HRH1PDE4APDE4BPDE4CPDE4D
SCHEMBL1402270 0.79 MCHR1 (0.49) HRH1PDE4APDE4BPDE4CPDE4D
SCHEMBL22181087 0.79 MCHR1 (0.45) HRH1PDE4APDE4BPDE4CPDE4D

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180029968-A1 COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND PURIFICATION METHOD OF COMPOUND OR RESIN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-02-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180029968-A1 COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND PURIFICATION METHOD OF COMPOUND OR RESIN PRMT9, ARGLU1, MLLT1 HRH1 3231/4885PDE4A 4779/4885PDE4B 4684/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.