SCHEMBL19842298

SCHEMBL19842298

CC(=O)c1cc(C(C)(c2ccc(N=O)c(C)c2)c2cc(C)c(O)c(C)c2)cc(C(C)(c2cc(C)c(N=O)c(C)c2)c2cc(C)c(N=O)c(C)c2)c1

nearest known ligand 0.34

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 1/20 0.34
▸ ESR2 Q92731 1/20 0.34
▸ KMT2A Q03164 4/20 0.32
▸ ALDH1A1 P00352 2/20 0.32
▸ MAPT P10636 2/20 0.32
▸ MEN1 O00255 2/20 0.32
▸ HSD17B2 P37059 1/20 0.32
▸ BRD4 O60885 1/20 0.32
▸ SMN1; SMN2 Q16637 1/20 0.31
▸ CA5A P35218 1/20 0.31
▸ LMNA P02545 1/20 0.30
▸ TTR P02766 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22328762 0.92 CA5A (0.36) ESR1ESR2KMT2AALDH1A1MAPT
SCHEMBL2754944 0.83 CA5A (0.43) ESR1ESR2KMT2AALDH1A1MAPT
SCHEMBL21181528 0.80 ESR1 (0.40) ESR1ESR2KMT2ASMN1; SMN2
SCHEMBL2754947 0.80 CA5A (0.43) ESR1ESR2KMT2AALDH1A1MAPT
SCHEMBL19847779 0.74 ALOX5 (0.42) ESR1ESR2KMT2AALDH1A1MAPT
SCHEMBL19884613 0.74 ESR1 (0.38) ESR1ESR2KMT2AALDH1A1MAPT
SCHEMBL14450782 0.73 CA5A (0.44) KMT2AALDH1A1MAPTMEN1SMN1; SMN2
SCHEMBL12526572 0.72 ESR1 (0.52) ESR1ESR2KMT2AALDH1A1MAPT
SCHEMBL21167288 0.70 ESR1 (0.55) ESR1ESR2KMT2AALDH1A1MEN1
SCHEMBL18643615 0.70 ESR1 (0.55) ESR1ESR2KMT2AALDH1A1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3279190-A1 RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHENOL COMPOUND USED THEREIN Mitsubishi Gas Chemical Company, Inc. (JP) 2018-02-07 — — EP disclosed
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