Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.34 |
| ▸ | NPC1 | O15118 | 4/20 | 0.34 |
| ▸ | RAB9A | P51151 | 4/20 | 0.34 |
| ▸ | USP2 | O75604 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 2/20 | 0.34 |
| ▸ | TSHR | P16473 | 3/20 | 0.33 |
| ▸ | ABL1 | P00519 | 1/20 | 0.33 |
| ▸ | RIN1 | Q13671 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | XBP1 | P17861 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20008913 | 0.82 | NPSR1 (0.57) | NPSR1ALDH1A1SMN1; SMN2GAATSHR | |
| SCHEMBL25476581 | 0.80 | NPSR1 (0.40) | NPSR1ALDH1A1NPC1RAB9AUSP2 | |
| SCHEMBL19985161 | 0.80 | KMT2A (0.39) | NPSR1ALDH1A1NPC1RAB9ASMN1; SMN2 | |
| SCHEMBL21911764 | 0.79 | NPSR1 (0.35) | NPSR1ALDH1A1NPC1RAB9AUSP2 | |
| SCHEMBL20799735 | 0.79 | — | — | |
| SCHEMBL19846281 | 0.78 | — | — | |
| SCHEMBL10172880 | 0.77 | ALDH1A1 (0.53) | NPSR1ALDH1A1NPC1RAB9AUSP2 | |
| SCHEMBL19846362 | 0.77 | CYP17A1 (0.31) | NPSR1 | |
| SCHEMBL24408976 | 0.75 | GAA (0.30) | GAAMAPTXBP1 | |
| SCHEMBL98471 | 0.74 | ALDH1A1 (0.47) | NPSR1ALDH1A1GAAMAPTLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230273519-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2023-08-31 | — | — | US | disclosed |
| US-20180039173-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-08 | — | — | US | disclosed |