SCHEMBL1989802

SCHEMBL1989802

C=C(CCc1c2ccccc2cc2ccccc12)C(=O)O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.46
ALDH1A1 P00352 4/20 0.46
MEN1 O00255 3/20 0.46
KMT2A Q03164 3/20 0.46
HPGD P15428 3/20 0.46
CYP1A2 P05177 3/20 0.46
GLA P06280 2/20 0.46
HSD17B10 Q99714 2/20 0.46
CYP2C19 P33261 2/20 0.46
POLB P06746 3/20 0.44
GPR35 Q9HC97 2/20 0.44
HTR2A P28223 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
GAA P10253 1/20 0.39
CYP2D6 P10635 1/20 0.39
ME2 P23368 1/20 0.38
ME1 P48163 1/20 0.38
ME3 Q16798 1/20 0.38
LMNA P02545 1/20 0.37
RXFP1 Q9HBX9 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7553090 0.90 CYP1A2 (0.43) KDM4EALDH1A1MEN1KMT2AHPGD
SCHEMBL1497455 0.83 KDM4E (0.48) KDM4EALDH1A1MEN1KMT2AHPGD
SCHEMBL29684732 0.82 MEN1 (0.53) KDM4EALDH1A1MEN1KMT2AHPGD
SCHEMBL1882693 0.82 MEN1 (0.53) KDM4EALDH1A1MEN1KMT2AHPGD
SCHEMBL3178981 0.81 CYP1A2 (0.45) KDM4EALDH1A1MEN1KMT2AHPGD
SCHEMBL766945 0.80 MTNR1A (0.44) KDM4EALDH1A1MEN1KMT2AHPGD
SCHEMBL3904716 0.79 FFAR1 (0.44) KDM4EALDH1A1MEN1KMT2AHPGD
SCHEMBL7655363 0.79 HTR2A (0.37) KDM4EALDH1A1MEN1KMT2AHPGD
SCHEMBL23206207 0.77 HTR2A (0.47) KDM4EALDH1A1MEN1KMT2AHPGD
SCHEMBL27378308 0.77 L3MBTL1 (0.52) KDM4EALDH1A1MEN1KMT2AHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 100 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2742385-A2 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS International Business Machines Corporation (US) 2014-06-18 EP claimed
US-8715907-B2 Developable bottom antireflective coating compositions for negative resists INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-05-06 US claimed
EP-1845415-B1 Process for producing an image using a first minimum bottom antireflective coating composition AZ ELECTRONIC MATERIALS USA (US) 2014-04-30 EP claimed
US-20130040238-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-02-14 US claimed
WO-2013023124-A2 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-02-14 WO claimed
EP-2010578-B1 COPOLYMERS USEFUL AS DEMULSIFIERS AND CLARIFIERS BAKER HUGHES INC (US) 2012-10-10 EP claimed
US-20070244248-A1 Copolymers useful as demulsifiers and clarifiers BAKER HUGHES INCORPORATED (US) 2007-10-18 US claimed
EP-1466216-B1 PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION AZ ELECTRONIC MATERIALS USA (US) 2006-07-26 EP claimed
EP-1309360-B1 MEDICAMENT INCORPORATION MATRIX SURMODICS INC (US) 2006-04-19 EP claimed
EP-0808855-B1 Fluorescent polymers and coating compositions ROHM & HAAS (US) 2002-07-17 EP claimed
US-5250395-A Coating substrate with film of blocked polymer and aromatic dye, exposing to electromagnetic radiation, contacting with organometallic compound to form etch barrier, etching with reactive ions INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1993-10-05 US claimed
US-12427714-B2 Functionalized product fabricated from a resin comprising a functional component and a polymeric resin, and method of making the same NATIONAL RESEARCH COUNCIL OF CANADA (CA) 2025-09-30 US disclosed
EP-4588985-A1 REACTIVE ADHESIVE TAPE TESA SE (DE) 2025-07-23 EP disclosed
EP-4588988-A1 REACTIVE ADHESIVE TAPE, REACTIVE ADHESIVE TAPE SYSTEM, BONDED COMPOSITE, AND METHOD FOR ELECTRICALLY RELEASING THE BONDED COMPOSITE TESA SE (DE) 2025-07-23 EP disclosed
US-12360294-B2 3D printed graded refractive index device CARLETON UNIVERSITY (CA) 2025-07-15 US disclosed
US-5886102-A Antireflective coating compositions SHIPLEY COMPANY, L.L.C. (US) 1999-03-23 US disclosed
EP-0813114-A2 Antireflective coating compositions Shipley Company LLC (US) 1997-12-17 EP disclosed
US-5250395-A Coating substrate with film of blocked polymer and aromatic dye, exposing to electromagnetic radiation, contacting with organometallic compound to form etch barrier, etching with reactive ions INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1993-10-05 US disclosed
EP-0062611-B1 PHOTOPOLYMERISATION PROCESS CIBA-GEIGY AG (CH) 1985-04-24 EP disclosed
EP-0062611-A2 Photopolymerisation process CIBA-GEIGY AG (CH) 1982-10-13 EP disclosed