Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MTNR1A | P48039 | 9/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | MTNR1B | P49286 | 5/20 | 0.39 |
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | NQO2 | P16083 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 3/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | GLA | P06280 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.37 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.37 |
| ▸ | PTGER1 | P34995 | 1/20 | 0.37 |
| ▸ | PTGER4 | P35408 | 1/20 | 0.37 |
| ▸ | PTGER3 | P43115 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1989843 | 0.86 | TDP1 (0.54) | MTNR1AKDM4EGPR84TDP1CYP1A2 | |
| SCHEMBL2243225 | 0.84 | TDP1 (0.49) | MTNR1AKDM4EALDH1A1GAAMTNR1B | |
| SCHEMBL5593879 | 0.84 | PTGER1 (0.51) | MTNR1AKDM4EALDH1A1GAATDP1 | |
| SCHEMBL30532048 | 0.83 | PTGER1 (0.50) | MTNR1AKDM4EALDH1A1GAATDP1 | |
| SCHEMBL1568310 | 0.81 | MTNR1A (0.48) | MTNR1AKDM4EALDH1A1GAAMTNR1B | |
| SCHEMBL3178981 | 0.80 | CYP1A2 (0.45) | KDM4EALDH1A1TDP1MEN1KMT2A | |
| SCHEMBL1989802 | 0.80 | KDM4E (0.46) | KDM4EALDH1A1GAATDP1MEN1 | |
| SCHEMBL31043020 | 0.80 | IAPP (0.51) | MTNR1AKDM4EALDH1A1GAAMTNR1B | |
| SCHEMBL29113112 | 0.78 | MEN1 (0.60) | MTNR1AKDM4EALDH1A1GAAMTNR1B | |
| SCHEMBL7560914 | 0.77 | TDP1 (0.51) | MTNR1AKDM4ETDP1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11392037-B2 | Resist underlayer film forming composition containing silicone having cyclic amino group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2022-07-19 | — | — | US | disclosed |
| EP-3670543-A2 | POLYMER PRODUCTION METHOD | Nissan Chemical Corporation (JP) | 2020-06-24 | — | — | EP | disclosed |
| US-10174255-B2 | Thermosetting composition with photo-alignment property, alignment layer, substrate with alignment layer, retardation plate, and device | DAI NIPPON PRINTING CO., LTD. (JP) | 2019-01-08 | — | — | US | disclosed |
| US-10017697-B2 | Thermosetting composition with photo-alignment property, alignment layer, substrate with alignment layer, retardation plate, and device | DAI NIPPON PRINTING CO., LTD. (JP) | 2018-07-10 | — | — | US | disclosed |
| US-10017696-B2 | Thermosetting composition with photo-alignment property, alignment layer, substrate with alignment layer, retardation plate, and device | DAI NIPPON PRINTING CO., LTD. (JP) | 2018-07-10 | — | — | US | disclosed |
| US-9760006-B2 | Silicon-containing resist underlayer film forming composition having urea group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| US-20160355735-A1 | THERMOSETTING COMPOSITION WITH PHOTO-ALIGNMENT PROPERTY, ALIGNMENT LAYER, SUBSTRATE WITH ALIGNMENT LAYER, RETARDATION PLATE, AND DEVICE | DAI NIPPON PRINTING CO., LTD. (JP) | 2016-12-08 | — | — | US | disclosed |
| US-20160348004-A1 | THERMOSETTING COMPOSITION WITH PHOTO-ALIGNMENT PROPERTY, ALIGNMENT LAYER, SUBSTRATE WITH ALIGNMENT LAYER, RETARDATION PLATE, AND DEVICE | DAI NIPPON PRINTING CO., LTD. (JP) | 2016-12-01 | — | — | US | disclosed |
| US-9217921-B2 | Resist underlayer film forming composition containing silicon having sulfide bond | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-12-22 | — | — | US | disclosed |
| US-20150322219-A1 | BOTTOM LAYER FILM-FORMATION COMPOSITION OF SELF-ORGANIZING FILM CONTAINING POLYCYCLIC ORGANIC VINYL COMPOUND | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-11-12 | — | — | US | disclosed |
| US-20110143149-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-06-16 | — | — | US | disclosed |
| US-20100330505-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING CYCLIC AMINO GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-30 | — | — | US | disclosed |
| US-20100304305-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING POLYMER HAVING NITROGEN-CONTAINING SILYL GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| US-7838606-B2 | Production process of copolymer for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD (JP) | 2010-11-23 | — | — | US | disclosed |
| US-20100291487-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING UREA GROUP | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 2010-11-18 | — | — | US | disclosed |
| EP-2249204-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING CYCLIC AMINO GROUP | Nissan Chemical Industries, Ltd. (JP) | 2010-11-10 | — | — | EP | disclosed |
| EP-2196854-A1 | COMPOSITION CONTAINING POLYMER HAVING NITROGENOUS SILYL GROUP FOR FORMING RESIST UNDERLAYER FILM | Nissan Chemical Industries, Ltd. (JP) | 2010-06-16 | — | — | EP | disclosed |
| US-7663301-B2 | for use as robust red organic phosphors | GENERAL ELECTRIC COMPANY (US) | 2010-02-16 | — | — | US | disclosed |
| WO-2006076247-A2 | PHOSPHORESCENT FLUORENE, ANTHRACENE AND/OR THIOPHENE SUBSTITUTED METALLO- PORPHYRINS AND RELATED COMPOUNDS | GENERAL ELECTRIC COMPANY (US) | 2006-07-20 | — | — | WO | disclosed |
| US-20060152149-A1 | Porphyrin compositions | GENERAL ELECTRIC COMPANY (US) | 2006-07-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110143149-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP | SRR, KDM2B, MSR1 | MTNR1A 4156/4885KDM4E 46/4885ALDH1A1 3585/4885 |
| US-20060152149-A1 | Porphyrin compositions | ACP1, MMS19, MVD | MTNR1A 2767/4885KDM4E 2546/4885ALDH1A1 1882/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.