SCHEMBL19901633

SCHEMBL19901633

CC1CC2CC(CC(C)(C(=O)NCCS(=O)(=O)O)C2)C1O

nearest known ligand 0.32

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.31
HTT P42858 1/20 0.31
GPBAR1 Q8TDU6 2/20 0.31
NR1H4 Q96RI1 1/20 0.31
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19901636 0.83 KDM4E (0.38) KDM4EHTTMEN1KMT2A
SCHEMBL17703606 0.81 HPGD (0.32) GPBAR1NR1H4
SCHEMBL19901644 0.78
SCHEMBL19901632 0.76
SCHEMBL19901665 0.75 EPHX2 (0.40) KMT2A
SCHEMBL17703635 0.72 GPBAR1 (0.34) GPBAR1NR1H4
SCHEMBL17703564 0.70 KDM4E (0.60) KDM4EHTTMEN1KMT2A
SCHEMBL19901634 0.69 EPHX2 (0.34) KDM4EHTTMEN1KMT2A
SCHEMBL17703616 0.68 GPBAR1 (0.35) GPBAR1NR1H4
SCHEMBL25457241 0.65 GPBAR1 (0.31) GPBAR1NR1H4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9904167-B2 Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2018-02-27 US disclosed