SCHEMBL19901636

SCHEMBL19901636

CC1CC2CC(C1)CC(C)(C(=O)NCCS(=O)(=O)O)C2

nearest known ligand 0.38

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.38
HTT P42858 1/20 0.38
EPHX2 P34913 15/20 0.36
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
DHFR P00374 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19901665 0.92 EPHX2 (0.40) EPHX2KMT2A
SCHEMBL17703606 0.87 HPGD (0.32)
SCHEMBL19901634 0.85 EPHX2 (0.34) KDM4EHTTEPHX2MEN1KMT2A
SCHEMBL19901633 0.83 KDM4E (0.31) KDM4EHTTMEN1KMT2A
SCHEMBL19901639 0.80 MEN1 (0.38) EPHX2MEN1KMT2A
SCHEMBL17703564 0.79 KDM4E (0.60) KDM4EHTTEPHX2MEN1KMT2A
SCHEMBL26064851 0.78 CHRNB2 (0.46) EPHX2MEN1KMT2A
SCHEMBL19426667 0.77 EPHX2 (0.42) KDM4EHTTEPHX2KMT2A
SCHEMBL17703616 0.76 GPBAR1 (0.35)
SCHEMBL19901646 0.75 CA12 (0.33) EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9904167-B2 Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2018-02-27 US disclosed