SCHEMBL19901665

SCHEMBL19901665

CC1CC2CC(C1)CC(C)(C(=O)NCCCS(=O)(=O)O)C2

nearest known ligand 0.40

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 19/20 0.40
KMT2A Q03164 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19901636 0.92 KDM4E (0.38) EPHX2KMT2A
SCHEMBL19901634 0.83 EPHX2 (0.34) EPHX2KMT2A
SCHEMBL19426667 0.81 EPHX2 (0.42) EPHX2KMT2A
SCHEMBL17703651 0.80 KDM4E (0.57) EPHX2KMT2A
SCHEMBL17703606 0.79 HPGD (0.32)
SCHEMBL17703610 0.77 DRD2 (0.34) EPHX2
SCHEMBL19901647 0.77 EPHX2 (0.35) EPHX2KMT2A
SCHEMBL19901629 0.76
SCHEMBL19901633 0.75 KDM4E (0.31) KMT2A
SCHEMBL23476706 0.74 DRD2 (0.49) EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9904167-B2 Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2018-02-27 US disclosed