Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 11/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | DHFR | P00374 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19901636 | 0.85 | KDM4E (0.38) | EPHX2DHFRKDM4EHTTMEN1 | |
| SCHEMBL19901665 | 0.83 | EPHX2 (0.40) | EPHX2KMT2A | |
| SCHEMBL17703586 | 0.77 | HTT (0.54) | DHFRALDH1A1MAPTSMN1; SMN2KDM4E | |
| SCHEMBL17703619 | 0.74 | CYP1A2 (0.34) | ALDH1A1 | |
| SCHEMBL19426667 | 0.74 | EPHX2 (0.42) | EPHX2KDM4EHTTKMT2A | |
| SCHEMBL24202163 | 0.72 | GLA (0.39) | EPHX2HSD17B10ALDH1A1HTT | |
| SCHEMBL19071219 | 0.72 | MEN1 (0.39) | EPHX2HSD17B10ALDH1A1TSHRKDM4E | |
| SCHEMBL16000695 | 0.72 | CCR2 (0.37) | EPHX2ALDH1A1 | |
| SCHEMBL17703606 | 0.72 | HPGD (0.32) | SMN1; SMN2TSHR | |
| SCHEMBL24897709 | 0.71 | ALDH1A1 (0.46) | EPHX2ALDH1A1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9904167-B2 | Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |