SCHEMBL19901642

SCHEMBL19901642

CC1CC2CC(C)(OC(=O)NCCCS(=O)(=O)O)CC2C1

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 7/20 0.33
FPR3 P25089 2/20 0.30
FPR2 P25090 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19901639 0.81 MEN1 (0.38) EPHX2
SCHEMBL17703549 0.80 EPHX2 (0.30) EPHX2
SCHEMBL17703552 0.72 GPBAR1 (0.33)
SCHEMBL17703606 0.71 HPGD (0.32)
SCHEMBL19901665 0.71 EPHX2 (0.40) EPHX2
SCHEMBL17758493 0.69 EPHX1 (0.59) EPHX2
SCHEMBL17703603 0.67
SCHEMBL17703610 0.65 DRD2 (0.34) EPHX2
SCHEMBL19901647 0.64 EPHX2 (0.35) EPHX2
SCHEMBL917886 0.64 TDP1 (0.64)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9904167-B2 Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2018-02-27 US disclosed