Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 4/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 13/20 | 0.33 |
| ▸ | CA12 | O43570 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | CA7 | P43166 | 1/20 | 0.33 |
| ▸ | CA9 | Q16790 | 1/20 | 0.33 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.33 |
| ▸ | CACNA1H | O95180 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19901642 | 0.81 | EPHX2 (0.33) | EPHX2 | |
| SCHEMBL19901636 | 0.80 | KDM4E (0.38) | MEN1KMT2AEPHX2 | |
| SCHEMBL17703552 | 0.78 | GPBAR1 (0.33) | — | |
| SCHEMBL19901646 | 0.72 | CA12 (0.33) | EPHX2CA12CA2CA7CA9 | |
| SCHEMBL19901665 | 0.72 | EPHX2 (0.40) | KMT2AEPHX2 | |
| SCHEMBL26064851 | 0.72 | CHRNB2 (0.46) | MEN1KMT2AALDH1A1MAPTEPHX2 | |
| SCHEMBL17703549 | 0.71 | EPHX2 (0.30) | EPHX2 | |
| SCHEMBL17703606 | 0.70 | HPGD (0.32) | — | |
| SCHEMBL17703564 | 0.69 | KDM4E (0.60) | MEN1KMT2AALDH1A1EPHX2 | |
| SCHEMBL19901634 | 0.68 | EPHX2 (0.34) | MEN1KMT2AALDH1A1MAPTEPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9904167-B2 | Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |