⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17703605 | 0.88 | — | — | |
| SCHEMBL19901666 | 0.85 | — | — | |
| SCHEMBL19901650 | 0.78 | — | — | |
| SCHEMBL19901648 | 0.75 | — | — | |
| SCHEMBL19901652 | 0.75 | USP2 (0.30) | — | |
| SCHEMBL17703609 | 0.73 | — | — | |
| SCHEMBL19901651 | 0.71 | HSD11B1 (0.34) | — | |
| SCHEMBL19901646 | 0.70 | CA12 (0.33) | — | |
| SCHEMBL19901655 | 0.69 | MEN1 (0.32) | — | |
| SCHEMBL19901654 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9904167-B2 | Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |