SCHEMBL19901655

SCHEMBL19901655

CC1CC2CC(C1)CC(C)(C(=O)N(CCS(=O)(=O)O)C(C)C)C2

nearest known ligand 0.32

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
TSHR P16473 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
EPHX2 P34913 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17703578 0.88
SCHEMBL19901651 0.84 HSD11B1 (0.34)
SCHEMBL19901652 0.82 USP2 (0.30)
SCHEMBL19901654 0.82
SCHEMBL19901653 0.78
SCHEMBL19901636 0.74 KDM4E (0.38) MEN1KMT2AEPHX2
SCHEMBL19901665 0.72 EPHX2 (0.40) KMT2AEPHX2
SCHEMBL17703580 0.71
SCHEMBL19901635 0.71
SCHEMBL19901634 0.71 EPHX2 (0.34) MEN1KMT2ATSHRSMN1; SMN2EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9904167-B2 Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2018-02-27 US disclosed