SCHEMBL19901646

SCHEMBL19901646

CC1CC2CC(C1)CC(C)(S(=O)(=O)NCCS(=O)(=O)O)C2

nearest known ligand 0.35

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
CA12 O43570 1/20 0.33
CA2 P00918 1/20 0.33
CA7 P43166 1/20 0.33
CA9 Q16790 1/20 0.33
CA14 Q9ULX7 1/20 0.33
EPHX2 P34913 6/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19901647 0.92 EPHX2 (0.35) CA12CA2CA7CA9CA14
SCHEMBL17703603 0.87
SCHEMBL19901649 0.80
SCHEMBL19901636 0.75 KDM4E (0.38) EPHX2
SCHEMBL19901639 0.72 MEN1 (0.38) CA12CA2CA7CA9CA14
SCHEMBL19901650 0.70
SCHEMBL19901665 0.70 EPHX2 (0.40) EPHX2
SCHEMBL19901667 0.70
SCHEMBL17703568 0.68
SCHEMBL19901648 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9904167-B2 Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2018-02-27 US disclosed