Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN1 | P18031 | 3/20 | 0.45 |
| ▸ | HSD17B2 | P37059 | 2/20 | 0.42 |
| ▸ | PTPN5 | P54829 | 1/20 | 0.40 |
| ▸ | HSD11B1 | P28845 | 5/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.39 |
| ▸ | UQCRB | P14927 | 1/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | RECQL | P46063 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
| ▸ | KIF11 | P52732 | 2/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | DHODH | Q02127 | 1/20 | 0.36 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL1795169 | 0.90 | ALDH1A1 (0.42) | HSD17B2HSD11B1ALDH1A1HSD17B3UQCRB | |
| Trifluoromethanesulfonic Acid SCHEMBL5456592 | 0.90 | ALDH1A1 (0.42) | HSD17B2HSD11B1ALDH1A1HSD17B3UQCRB | |
| Trifluoromethanesulfonic Acid SCHEMBL31473545 | 0.87 | PTPN1 (0.53) | PTPN1PTPN5RECQLKIF11MAPT | |
| Biphenyl SCHEMBL1993781 | 0.84 | PTPN1 (0.44) | PTPN1PTPN5HSD11B1RECQL | |
| Biphenyl SCHEMBL27775707 | 0.82 | MMP3 (0.47) | PTPN1PTPN5UQCRBRECQLRAB9A | |
| Trifluoromethanesulfonic Acid SCHEMBL27688608 | 0.82 | PTPN1 (0.47) | PTPN1HSD17B2PTPN5HSD11B1ALDH1A1 | |
| Tert-Butylbenzene SCHEMBL30716927 | 0.81 | PTPN1 (0.46) | PTPN1HSD17B2HSD11B1ALDH1A1HSD17B3 | |
| Trifluoromethanesulfonic Acid SCHEMBL27683117 | 0.81 | PTPN1 (0.45) | PTPN1HSD17B2PTPN5HSD11B1ALDH1A1 | |
| Biphenyl SCHEMBL27838332 | 0.81 | PTPN1 (0.53) | PTPN1PTPN5HSD11B1ALDH1A1RECQL | |
| Biphenyl SCHEMBL28044662 | 0.81 | PTPN1 (0.39) | PTPN1NPC1RAB9AKIF11MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026107261-A1 | PURIFICATION OF PHOTORESIST POLYMER BY SURFACE-MODIFIED POROUS POLYETHYLENE MEMBRANE | ENTEGRIS, INC. (US) | 2026-05-21 | — | — | WO | claimed |
| US-7399570-B2 | Water-soluble negative photoresist polymer and composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2008-07-15 | — | — | US | claimed |
| US-7361447-B2 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2008-04-22 | — | — | US | claimed |
| US-7279256-B2 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2007-10-09 | — | — | US | claimed |
| US-7270934-B2 | Water-soluble negative photoresist polymer, composition containing the same, and method of forming a photoresist pattern | HYNIX SEMICONDUCTOR INC. (KR) | 2007-09-18 | — | — | US | claimed |
| US-7235349-B2 | Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator | HYNIX SEMICONDUCTOR INC. (KR) | 2007-06-26 | — | — | US | claimed |
| US-7138218-B2 | Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator | HYNIX SEMICONDUCTOR INC. (KR) | 2006-11-21 | — | — | US | claimed |
| US-7129023-B2 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2006-10-31 | — | — | US | claimed |
| US-20060183050-A1 | Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator | HYNIX SEMICONDUCTOR INC. (KR) | 2006-08-17 | — | — | US | claimed |
| US-7081325-B2 | Photoresist polymer and photoresist composition including the same | HYNIX SEMICONDUCTOR INC. (KR) | 2006-07-25 | — | — | US | claimed |
| US-20050026080-A1 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2005-02-03 | — | — | US | claimed |
| US-6849375-B2 | Photoresist monomers, polymers thereof and photoresist compositions containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2005-02-01 | — | — | US | claimed |
| US-20040265743-A1 | Photoresist polymer and photoresist composition including the same | HYNIX SEMICONDUCTOR INC. (KR) | 2004-12-30 | — | — | US | claimed |
| US-6806025-B2 | FLUORINATED FUSED RING MONOMERS AND POLYMERS; MAYBE COPOLYMERIZED WITH A SUBSTITUTED MALEIMIDE AND/OR A TRIFLUOROMETHYL ACRYLATE | HYNIX SEMICONDUCTOR INC. (KR) | 2004-10-19 | — | — | US | claimed |
| US-20030148212-A1 | Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator | HYNIX SEMICONDUCTOR INC. (KR) | 2003-08-07 | — | — | US | claimed |
| US-20030091927-A1 | Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion | HYNIX SEMICONDUCTOR INC. (KR) | 2003-05-15 | — | — | US | claimed |
| US-20030022101-A1 | Photoresist monomers, polymers thereof and photoresist compositions containing the same | INTELLECTUAL DISCOVERY CO. LTD. (KR) | 2003-01-30 | — | — | US | claimed |
| US-20030022100-A1 | Photoresist monomers, polymers thereof and photoresist compositions containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-30 | — | — | US | claimed |
| US-20030003379-A1 | Photoresist monomers, polymers thereof and photoresist compositons containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-02 | — | — | US | claimed |
| US-20020160301-A1 | Cross-linker monomer comprising double bond and photoresist copolymer containing the same | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-10-31 | — | — | US | claimed |