Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL31473545

O=S(=O)(O)C(F)(F)F.Sc1ccc(-c2ccccc2)cc1

nearest known ligand 0.53

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 4/20 0.53
PTPN5 P54829 2/20 0.43
KIF11 P52732 1/20 0.42
CA1 P00915 2/20 0.39
CA2 P00918 2/20 0.39
CA9 Q16790 2/20 0.39
CA12 O43570 1/20 0.39
MMP2 P08253 1/20 0.38
MMP7 P09237 1/20 0.38
MMP14 P50281 1/20 0.38
MEN1 O00255 1/20 0.38
GAA P10253 1/20 0.38
MAPT P10636 1/20 0.38
MAPK1 P28482 1/20 0.38
HTT P42858 1/20 0.38
RECQL P46063 1/20 0.38
KMT2A Q03164 1/20 0.38
HDAC1 Q13547 1/20 0.37
HDAC7 Q8WUI4 1/20 0.37
HDAC8 Q9BY41 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Biphenyl SCHEMBL27775707 0.91 MMP3 (0.47) PTPN1PTPN5KIF11MEN1GAA
Biphenyl SCHEMBL1993781 0.90 PTPN1 (0.44) PTPN1PTPN5CA1CA2CA9
Trifluoromethanesulfonic Acid SCHEMBL29587491 0.88 PTPN1 (0.42) PTPN1CA1CA2CA9
Trifluoromethanesulfonic Acid SCHEMBL2058739 0.88 PTPN1 (0.42) PTPN1CA1CA2CA9
Biphenyl SCHEMBL1050411 0.88 PTPN1 (0.58) PTPN1PTPN5KIF11CA1CA2
Biphenyl SCHEMBL1992773 0.87 PTPN1 (0.45) PTPN1PTPN5KIF11MAPTRECQL
Biphenyl SCHEMBL27838332 0.86 PTPN1 (0.53) PTPN1PTPN5KIF11CA1CA2
Biphenyl SCHEMBL304392 0.86 PTPN1 (0.56) PTPN1PTPN5KIF11CA1CA2
Biphenyl SCHEMBL5410059 0.86 PTPN1 (0.56) PTPN1PTPN5KIF11CA1CA2
Biphenyl SCHEMBL2192409 0.86 PTPN1 (0.56) PTPN1PTPN5KIF11CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119816784-A Fabrication of integrated circuits using positive photo-patternable dielectrics comprising high silicon content polysilsesquioxanes 潍坊星泰克微电子材料有限公司 2025-04-11 CN disclosed
CN-119631021-A Photolithography method using silicon photoresist 潍坊星泰克微电子材料有限公司 2025-03-14 CN disclosed