SCHEMBL19928536

SCHEMBL19928536

CCC(C)(C)c1cc(C(C)(C)C)c(C(C)(CC)CC)cc1C(C)(C)C

nearest known ligand 0.32

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.32
ALDH1A1 P00352 1/20 0.32
CYP1A2 P05177 1/20 0.32
MAPT P10636 1/20 0.32
ALOX15 P16050 1/20 0.32
ATP2A2 P16615 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
ATP2A3 Q93084 1/20 0.32
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27115531 0.80 KDM4E (0.31) KDM4EALDH1A1CYP1A2MAPTALOX15
SCHEMBL27117570 0.71 AR (0.32)
SCHEMBL15281848 0.71 LMNA (0.31)
SCHEMBL7132801 0.71 ALDH1A1 (0.53) KDM4EALDH1A1CYP1A2MAPTALOX15
SCHEMBL24085037 0.70
SCHEMBL24910672 0.70 TSHR (0.46) CYP1A2
SCHEMBL24000930 0.68 MAPK1 (0.39) KDM4EALDH1A1SMN1; SMN2
SCHEMBL9354769 0.68 ALOX15 (0.68) KDM4EALDH1A1CYP1A2MAPTALOX15
SCHEMBL14327701 0.68 KDM4E (0.32) KDM4EALDH1A1CYP1A2MAPTALOX15
SCHEMBL9292312 0.68 ALOX15 (0.68) KDM4EALDH1A1CYP1A2MAPTALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9910354-B2 Resist underlayer film-forming composition and method for forming resist pattern using the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-03-06 US disclosed