SCHEMBL1994288

SCHEMBL1994288

O=C(I)c1ccc(I)cc1

nearest known ligand 0.65

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TPMT P51580 1/20 0.65
CA1 P00915 2/20 0.62
CA2 P00918 2/20 0.62
GSK3B P49841 1/20 0.54
PTPN2 P17706 1/20 0.42
PTPN1 P18031 1/20 0.42
APP P05067 1/20 0.42
TRPV1 Q8NER1 2/20 0.41
RXRA P19793 1/20 0.41
RXRB P28702 1/20 0.41
TP53 P04637 1/20 0.40
TSHR P16473 1/20 0.40
CES2 O00748 1/20 0.39
CES1 P23141 1/20 0.39
PHGDH O43175 1/20 0.38
PDPK1 O15530 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL815029 0.87 TSHR (0.50) TPMTCA1CA2TP53TSHR
SCHEMBL1244094 0.81 TPMT (0.65) TPMTCA1CA2GSK3B
SCHEMBL9389844 0.81 TPMT (0.65) TPMTCA1CA2GSK3B
SCHEMBL3760858 0.81 TPMT (0.65) TPMTCA1CA2GSK3BCES2
SCHEMBL3841301 0.81 TPMT (0.65) TPMTCA1CA2GSK3B
SCHEMBL2163424 0.79 TPMT (0.62) TPMTCA1CA2GSK3BPTPN2
SCHEMBL79334 0.79 TPMT (1.00) TPMTCA1CA2GSK3BRXRA
SCHEMBL20285345 0.78 RXRA (0.46) CA1CA2GSK3BPTPN1RXRA
SCHEMBL23391017 0.77 TPMT (0.59) TPMTCA1CA2GSK3BPTPN2
Methane SCHEMBL17672827 0.77 TPMT (0.94) TPMTCA1CA2GSK3BRXRA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11111348-B2 Method for treating surface of resin material layer and resin material MITSUBISHI HEAVY INDUSTRIES, LTD. (JP) 2021-09-07 US disclosed
EP-3450488-B1 METHOD FOR TREATING SURFACE OF RESIN MATERIAL LAYER AND RESIN MATERIAL MITSUBISHI HEAVY IND LTD (JP) 2021-03-24 EP disclosed
US-20200317876-A1 METHOD FOR TREATING SURFACE OF RESIN MATERIAL LAYER AND RESIN MATERIAL MITSUBISHI HEAVY INDUSTRIES, LTD. (JP) 2020-10-08 US disclosed
US-8773745-B2 Electrochromic material KYUSHU UNIVERSITY (JP) 2014-07-08 US disclosed
US-20110149367-A1 ELECTROCHROMIC MATERIAL KYUSHU UNIVERSITY (JP) 2011-06-23 US disclosed