SCHEMBL1996945

SCHEMBL1996945

C=C(CC1CCCCC1)C(=O)Oc1ccccc1

nearest known ligand 0.53

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 4/20 0.48
RAB9A P51151 3/20 0.48
ALDH1A1 P00352 2/20 0.48
NPC1 O15118 2/20 0.46
METAP2 P50579 1/20 0.42
METAP1 P53582 1/20 0.42
POLB P06746 1/20 0.41
ELANE P08246 1/20 0.41
PKM P14618 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
LMNA P02545 1/20 0.39
EPHX1 P07099 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8388501 0.81 RAB9A (0.48) EPHX2RAB9AALDH1A1NPC1POLB
SCHEMBL4105896 0.81 HPGD (0.54) EPHX2RAB9AALDH1A1NPC1METAP2
SCHEMBL9586021 0.79 HPGD (0.53) EPHX2RAB9AALDH1A1NPC1METAP2
SCHEMBL4441964 0.77 TDP1 (0.45) RAB9AALDH1A1ELANESMN1; SMN2
SCHEMBL9064289 0.77 HTR1A (0.39) RAB9AALDH1A1NPC1ELANESMN1; SMN2
SCHEMBL1994112 0.76 ALDH1A1 (0.51) EPHX2RAB9AALDH1A1NPC1POLB
SCHEMBL10378216 0.76 EPHX2 (0.51) EPHX2RAB9AALDH1A1NPC1SMN1; SMN2
SCHEMBL13688365 0.74 ALDH1A1 (0.49) EPHX2RAB9AALDH1A1NPC1METAP2
SCHEMBL824141 0.73 ELANE (0.46) ALDH1A1ELANEPKM
SCHEMBL313014 0.72 ELANE (0.42) RAB9AALDH1A1ELANESMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7960476-B2 Acrylic resin composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-06-14 US disclosed
US-7695782-B2 Optical laminate SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-04-13 US disclosed
CN-100430828-C Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern JSR CORP (JP) 2008-11-05 CN disclosed
US-20080131640-A1 ACRYLIC RESIN COMPOSITION KAWAMURA AKIRA 2008-06-05 US disclosed
US-20060062938-A1 adhesive layer formed by hardening an adhesive obtained by compounding a cross-linking agent such as hexamethylene diisocyanate in an acrylic resin; suppressed light leakage and excellent durability SUMITOMO CHEMICAL COMPANY, LIMITED 2006-03-23 US disclosed
US-20060036040-A1 Adhesive SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-02-16 US disclosed
US-20050261433-A1 Acrylic resin SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-11-24 US disclosed
US-20050244657-A1 Acrylic resin composition SUMITOMO CHEMICAL COMPANY, LIMITED 2005-11-03 US disclosed
US-20050215743-A1 Acrylic resin SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-09-29 US disclosed
US-20050065252-A1 Acrylic resin composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-03-24 US disclosed
CN-1582414-A Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern JSR CORP (JP) 2005-02-16 CN disclosed