SCHEMBL19973229

SCHEMBL19973229

[SiH3]O[SiH2]NCc1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 2/20 0.43
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
THRB P10828 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
MAPT P10636 5/20 0.41
CYP3A4 P08684 2/20 0.41
KDM4E B2RXH2 1/20 0.41
ALOX12 P18054 3/20 0.39
ALDH1A1 P00352 2/20 0.39
ADH1B P00325 1/20 0.39
ADH1C P00326 1/20 0.39
ADH1A P07327 1/20 0.39
ADH7 P40394 1/20 0.39
HPGD P15428 1/20 0.39
CA12 O43570 1/20 0.39
CA2 P00918 1/20 0.39
CA7 P43166 1/20 0.39
CA14 Q9ULX7 1/20 0.39
MAOA P21397 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19973224 0.84 IDO1 (0.38) IDO1MEN1KMT2ATHRBTDP1
SCHEMBL18692045 0.75 IDO1 (0.48) IDO1MEN1KMT2ATHRBTDP1
SCHEMBL3133242 0.74 IDO1 (0.52) IDO1MEN1KMT2ATHRBTDP1
SCHEMBL31302856 0.72 IDO1 (0.50) IDO1MEN1KMT2ATHRBTDP1
SCHEMBL16583005 0.71 IDO1 (0.44) IDO1MEN1KMT2ATHRBTDP1
SCHEMBL29128805 0.71 IDO1 (0.50) IDO1MEN1KMT2ATHRBTDP1
SCHEMBL16582961 0.70 IDO1 (0.48) IDO1MEN1KMT2ATHRBTDP1
SCHEMBL14813087 0.70 IDO1 (0.48) IDO1MEN1KMT2ATHRBTDP1
SCHEMBL27935487 0.70 MAPT (0.52) IDO1MEN1KMT2ATHRBTDP1
SCHEMBL16582938 0.68 IDO1 (0.41) IDO1MEN1KMT2ATHRBTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3516089-B1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS VERSUM MAT US LLC (US) 2023-12-20 EP claimed
US-11584854-B2 Compositions and methods for the deposition of silicon oxide films VERSUM MATERIALS US, LLC (US) 2023-02-21 US claimed
CN-113403605-A Compositions and methods for depositing silicon oxide films 弗萨姆材料美国有限责任公司 2021-09-17 CN claimed
US-20200308416-A1 Compositions And Methods For The Deposition Of Silicon Oxide Films VERSUM MATERIALS US, LLC (US) 2020-10-01 US claimed
US-20200040192-A9 Compositions and Methods for the Deposition of Silicon Oxide Films VERSUM MATERIALS US, LLC (US) 2020-02-06 US claimed
EP-3516089-A1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS Versum Materials US, LLC (US) 2019-07-31 EP claimed
US-20180127592-A1 Compositions and Methods for the Deposition of Silicon Oxide Films VERSUM MATERIALS US, LLC (US) 2018-05-10 US claimed
WO-2018053129-A1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS VERSUM MATERIALS US, LLC (US) 2018-03-22 WO claimed
EP-3516089-B1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS VERSUM MAT US LLC (US) 2023-12-20 EP disclosed
US-11584854-B2 Compositions and methods for the deposition of silicon oxide films VERSUM MATERIALS US, LLC (US) 2023-02-21 US disclosed
CN-113403605-A Compositions and methods for depositing silicon oxide films 弗萨姆材料美国有限责任公司 2021-09-17 CN disclosed
US-20200308416-A1 Compositions And Methods For The Deposition Of Silicon Oxide Films VERSUM MATERIALS US, LLC (US) 2020-10-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200308416-A1 Compositions And Methods For The Deposition Of Silicon Oxide Films SEPTIN9, SGMS1, SGMS2 IDO1 2315/4885MEN1 297/4885KMT2A 1162/4885
US-20180127592-A1 Compositions and Methods for the Deposition of Silicon Oxide Films SEPTIN9, SGMS1, SGMS2 IDO1 2315/4885MEN1 297/4885KMT2A 1162/4885
US-20200040192-A9 Compositions and Methods for the Deposition of Silicon Oxide Films SEPTIN9, SGMS1, SGMS2 IDO1 2315/4885MEN1 297/4885KMT2A 1162/4885
US-11584854-B2 Compositions and methods for the deposition of silicon oxide films SEPTIN9, SGMS1, SGMS2 IDO1 2315/4885MEN1 297/4885KMT2A 1162/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.