SCHEMBL29128805

SCHEMBL29128805

[SiH3]N[SiH2]NCc1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 2/20 0.50
MAPT P10636 4/20 0.48
CYP3A4 P08684 2/20 0.48
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
THRB P10828 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
KDM4E B2RXH2 1/20 0.43
CA12 O43570 2/20 0.42
CA2 P00918 2/20 0.42
CA7 P43166 2/20 0.42
CA14 Q9ULX7 2/20 0.42
CA1 P00915 1/20 0.42
ALOX12 P18054 2/20 0.40
ADH1B P00325 1/20 0.40
ADH1C P00326 1/20 0.40
ADH1A P07327 1/20 0.40
ADH7 P40394 1/20 0.40
ALDH1A1 P00352 1/20 0.40
HPGD P15428 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3133242 0.85 IDO1 (0.52) IDO1MAPTCYP3A4MEN1KMT2A
SCHEMBL18692045 0.76 IDO1 (0.48) IDO1MAPTCYP3A4MEN1KMT2A
SCHEMBL31302856 0.73 IDO1 (0.50) IDO1MAPTCYP3A4MEN1KMT2A
SCHEMBL16583005 0.73 IDO1 (0.44) IDO1MAPTCYP3A4MEN1KMT2A
SCHEMBL3130128 0.72
SCHEMBL16582961 0.71 IDO1 (0.48) IDO1MAPTCYP3A4MEN1KMT2A
SCHEMBL14813087 0.71 IDO1 (0.48) IDO1MAPTCYP3A4MEN1KMT2A
SCHEMBL19973229 0.71 IDO1 (0.43) IDO1MAPTCYP3A4MEN1KMT2A
SCHEMBL16582938 0.70 IDO1 (0.41) IDO1MAPTCYP3A4MEN1KMT2A
SCHEMBL4872577 0.69 CALM1 (0.41) IDO1MAPTCYP3A4MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117265512-A Method for depositing conformal metal or metalloid silicon nitride films and resulting films 弗萨姆材料美国有限责任公司 2023-12-22 CN disclosed