SCHEMBL1998845

SCHEMBL1998845

CCCCCCOC(=O)C(C)=CC=Cc1ccccc1

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.62
POLB P06746 2/20 0.55
TDP1 Q9NUW8 1/20 0.51
ALDH1A1 P00352 5/20 0.48
LMNA P02545 3/20 0.48
TSHR P16473 4/20 0.48
MEN1 O00255 1/20 0.46
KMT2A Q03164 1/20 0.46
TP53 P04637 1/20 0.46
CYP3A4 P08684 1/20 0.46
MAPK1 P28482 1/20 0.46
EGFR P00533 1/20 0.45
GAA P10253 1/20 0.44
MAPT P10636 1/20 0.44
HSD17B10 Q99714 1/20 0.43
PPARG P37231 3/20 0.42
APP P05067 2/20 0.41
NPC1 O15118 1/20 0.41
RAB9A P51151 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6545140 1.00 KDM4E (0.62) KDM4EPOLBTDP1ALDH1A1LMNA
SCHEMBL8945396 1.00 KDM4E (0.62) KDM4EPOLBTDP1ALDH1A1LMNA
SCHEMBL9289108 0.99 KDM4E (0.63) KDM4EPOLBTDP1ALDH1A1LMNA
SCHEMBL374959 0.95 KDM4E (0.68) KDM4EPOLBTDP1ALDH1A1LMNA
SCHEMBL10395020 0.87 POLB (0.56) KDM4EPOLBTDP1ALDH1A1LMNA
SCHEMBL10395019 0.87 POLB (0.56) KDM4EPOLBTDP1ALDH1A1LMNA
SCHEMBL11040105 0.87 KDM4E (0.57) KDM4EPOLBTDP1ALDH1A1LMNA
SCHEMBL4914902 0.86 KDM4E (0.55) KDM4EPOLBTDP1ALDH1A1LMNA
SCHEMBL9065653 0.86 KDM4E (0.58) KDM4EPOLBTDP1ALDH1A1LMNA
SCHEMBL5661958 0.85 KDM4E (0.57) KDM4EPOLBTDP1ALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8202436-B2 Use of block copolymers for preparing conductive nanostructures KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION (KR) 2012-06-19 US claimed
WO-2011074852-A1 USE OF BLOCK COPOLYMERS FOR PREPARING CONDUCTIVE NANOSTRUCTURES KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION (KR) 2011-06-23 WO claimed
US-20110147337-A1 USE OF BLOCK COPOLYMERS FOR PREPARING CONDUCTIVE NANOSTRUCTURES KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION (KR) 2011-06-23 US claimed
US-6632883-B2 Pressure sensitive adhesive MASSACHUSETTS INSTITUTE OF TECHNOLOGY 2003-10-14 US claimed
US-20020042480-A1 Baroplastic materials MASSACHUSETTS, UNIVERSITY OF 2002-04-11 US claimed
US-9177818-B2 Pattern formation method and block copolymer KABUSHIKI KAISHA TOSHIBA (JP) 2015-11-03 US disclosed
US-20140127910-A1 PATTERN FORMATION METHOD AND BLOCK COPOLYMER KABUSHIKI KAISHA TOSHIBA (JP) 2014-05-08 US disclosed
US-8202436-B2 Use of block copolymers for preparing conductive nanostructures KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION (KR) 2012-06-19 US disclosed
WO-2011074852-A1 USE OF BLOCK COPOLYMERS FOR PREPARING CONDUCTIVE NANOSTRUCTURES KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION (KR) 2011-06-23 WO disclosed
US-20110147337-A1 USE OF BLOCK COPOLYMERS FOR PREPARING CONDUCTIVE NANOSTRUCTURES KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION (KR) 2011-06-23 US disclosed
US-6632883-B2 Pressure sensitive adhesive MASSACHUSETTS INSTITUTE OF TECHNOLOGY 2003-10-14 US disclosed
US-20020042480-A1 Baroplastic materials MASSACHUSETTS, UNIVERSITY OF 2002-04-11 US disclosed
WO-2001060912-A2 PRESSURE PROCESSABLE POLYMER COMPOSITIONS MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2001-08-23 WO disclosed