Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FKBP1A | P62942 | 4/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.39 |
| ▸ | HMGCR | P04035 | 3/20 | 0.34 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.33 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20024446 | 0.90 | HMGCR (0.35) | FKBP1AALDH1A1HMGCRCYP4F2CYP4A11 | |
| SCHEMBL13431263 | 0.83 | TSHR (0.53) | FKBP1AALDH1A1HMGCRCYP4F2CYP4A11 | |
| SCHEMBL10820210 | 0.82 | FKBP1A (0.34) | FKBP1AALDH1A1HMGCRSMN1; SMN2 | |
| SCHEMBL20024454 | 0.80 | HMGCR (0.32) | FKBP1AALDH1A1HMGCR | |
| SCHEMBL47407 | 0.80 | ALDH1A1 (0.49) | ALDH1A1HMGCRSMN1; SMN2 | |
| SCHEMBL18326353 | 0.79 | SMN1; SMN2 (0.46) | ALDH1A1HMGCRSMN1; SMN2TDP1 | |
| SCHEMBL20024439 | 0.79 | HMGCR (0.32) | ALDH1A1HMGCR | |
| SCHEMBL20024433 | 0.79 | HMGCR (0.30) | HMGCR | |
| SCHEMBL14884010 | 0.79 | HMGCR (0.33) | ALDH1A1HMGCR | |
| SCHEMBL13667082 | 0.78 | CYP4F2 (0.42) | FKBP1AALDH1A1CYP4F2CYP4A11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230236505-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LAMINATED FILM | SAN-APRO LTD. (JP) | 2023-07-27 | — | — | US | disclosed |
| US-20180095366-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMATION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-04-05 | — | — | US | disclosed |