SCHEMBL2004808

SCHEMBL2004808

C[SiH](N[SiH3])c1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.38
LMNA P02545 1/20 0.30
ALOX12 P18054 1/20 0.30
ACHE P22303 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18143562 0.78 TSHR (0.35) TSHRLMNAALOX12ACHE
SCHEMBL2270141 0.76 TSHR (0.39) TSHRLMNAALOX12ACHE
SCHEMBL2542387 0.72 TSHR (0.35) TSHRALOX12
SCHEMBL8219011 0.72 TSHR (0.42) TSHRLMNAALOX12
SCHEMBL23319721 0.70 TDP1 (0.41) TSHRLMNAALOX12
SCHEMBL8217607 0.70
SCHEMBL2274480 0.70 KCNN4 (0.37) LMNA
SCHEMBL8380718 0.69
Butadiene SCHEMBL1789090 0.69 ALDH1A1 (0.33) TSHR
SCHEMBL55166 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220235266-A1 LIGHT EMITTING ELEMENT WITH EMISSIVE SEMICONDUCTOR NANOCRYSTAL MATERIALS AND PROJECTOR LIGHT SOURCE BASED ON THESE MATERIALS Sony Group Corporation (JP) 2022-07-28 US claimed
US-20220213381-A1 NANOCRYSTAL EMISSIVE MATERIALS, LIGHT EMITTING ELEMENT, AND PROJECTOR LIGHT SOURCE BASED ON THESE MATERIALS Sony Group Corporation (JP) 2022-07-07 US claimed
WO-2020233859-A1 NANOCRYSTAL EMISSIVE MATERIALS, LIGHT EMITTING ELEMENT, AND PROJECTOR LIGHT SOURCE BASED ON THESE MATERIALS SONY CORPORATION (JP) 2020-11-26 WO claimed
WO-2020233858-A1 LIGHT EMITTING ELEMENT WITH EMISSIVE SEMICONDUCTOR NANOCRYSTAL MATERIALS AND PROJECTOR LIGHT SOURCE BASED ON THESE MATERIALS SONY CORPORATION (JP) 2020-11-26 WO claimed
US-5270151-A Spin on oxygen reactive ion etch barrier INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1993-12-14 US claimed
US-20220235266-A1 LIGHT EMITTING ELEMENT WITH EMISSIVE SEMICONDUCTOR NANOCRYSTAL MATERIALS AND PROJECTOR LIGHT SOURCE BASED ON THESE MATERIALS Sony Group Corporation (JP) 2022-07-28 US disclosed
US-20220213381-A1 NANOCRYSTAL EMISSIVE MATERIALS, LIGHT EMITTING ELEMENT, AND PROJECTOR LIGHT SOURCE BASED ON THESE MATERIALS Sony Group Corporation (JP) 2022-07-07 US disclosed
WO-2020233859-A1 NANOCRYSTAL EMISSIVE MATERIALS, LIGHT EMITTING ELEMENT, AND PROJECTOR LIGHT SOURCE BASED ON THESE MATERIALS SONY CORPORATION (JP) 2020-11-26 WO disclosed
WO-2020233858-A1 LIGHT EMITTING ELEMENT WITH EMISSIVE SEMICONDUCTOR NANOCRYSTAL MATERIALS AND PROJECTOR LIGHT SOURCE BASED ON THESE MATERIALS SONY CORPORATION (JP) 2020-11-26 WO disclosed
CN-109553777-B Room-temperature curing agent of high-temperature-resistant organosilicon material, preparation method and application 中国科学院化学研究所 2020-07-14 CN disclosed
CN-102449035-B Hybrid polymers composed of cyanate and silazane, method for the production thereof, and use thereof FRAUNHOFER GES FORSCHUNG 2014-06-04 CN disclosed
US-8431189-B2 Carbon nanotube-nanofiber composite structure KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION (KR) 2013-04-30 US disclosed
WO-2011078527-A1 CARBON NANOTUBE-NANOFIBER COMPOSITE STRUCTURE KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION (KR) 2011-06-30 WO disclosed
US-20110151736-A1 CARBON NANOTUBE-NANOFIBER COMPOSITE STRUCTURE KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION (KR) 2011-06-23 US disclosed
EP-0450957-B1 Production of methylphenyltrisiloxane SHINETSU CHEMICAL CO (JP) 1995-07-19 EP disclosed
US-5302682-A Method for the preparation of diorganosiloxane-diorganosilazane copolymer DOW CORNING TORAY SILICONE CO., LTD. (JP) 1994-04-12 US disclosed
US-5270151-A Spin on oxygen reactive ion etch barrier INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1993-12-14 US disclosed
US-5210162-A Addition polymerization with organometallic silicon, germanium or tin catalyst WACKER-CHEMIE GMBH (DE) 1993-05-11 US disclosed
US-5097055-A PRODUCTION OF METHYLPHENYLTRISILOXANE SHIN-ETSU CHEMICAL CO., LTD. (JP) 1992-03-17 US disclosed
EP-0450957-A2 Production of methylphenyltrisiloxane SHIN-ETSU CHEMICAL CO., LTD. (JP) 1991-10-09 EP disclosed