SCHEMBL2008111

SCHEMBL2008111

Cc1ccccc1CC(C)(I)c1ccccc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 2/20 0.39
ALDH1A1 P00352 2/20 0.36
ALOX15 P16050 1/20 0.36
SSTR4 P31391 1/20 0.35
NR3C2 P08235 1/20 0.35
HPGD P15428 1/20 0.35
CTBP2 P56545 1/20 0.35
MAPK1 P28482 1/20 0.34
ESR1 P03372 1/20 0.34
ESR2 Q92731 1/20 0.34
CHRM2 P08172 1/20 0.34
PTGS1 P23219 1/20 0.34
PTGS2 P35354 1/20 0.34
RIPK1 Q13546 1/20 0.33
SLC6A2 P23975 1/20 0.33
SLC6A4 P31645 1/20 0.33
CYP11B1 P15538 1/20 0.33
CYP11B2 P19099 1/20 0.33
KMT2A Q03164 1/20 0.33
TSHR P16473 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29907229 0.85 KIF11 (0.32) TAAR1
SCHEMBL3217545 0.77 TAAR1 (0.39) TAAR1ALDH1A1SSTR4NR3C2HPGD
SCHEMBL29877498 0.77 TAAR1 (0.37) TAAR1ALDH1A1SSTR4NR3C2HPGD
SCHEMBL808983 0.75 TAAR1 (0.45) TAAR1ALDH1A1SSTR4NR3C2HPGD
SCHEMBL3167835 0.74 RIPK1 (0.48) TAAR1ALDH1A1SSTR4NR3C2HPGD
SCHEMBL28114102 0.74 MEN1 (0.44) TAAR1ALDH1A1NR3C2HPGDCTBP2
SCHEMBL2008110 0.73 KIF11 (0.44) TAAR1ALDH1A1MAPK1SLC6A2KMT2A
SCHEMBL8695221 0.73 HTT (0.43) ALDH1A1SSTR4NR3C2HPGDCTBP2
SCHEMBL10360565 0.72 TAAR1 (0.38) TAAR1ALDH1A1HPGDCTBP2CHRM2
SCHEMBL19085950 0.71 TAAR1 (0.45) TAAR1ALDH1A1SSTR4NR3C2HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2012037392-A3 FLUID SEAL ASSEMBLY SKF USA INC. (US) 2012-05-10 WO claimed
EP-1947130-B1 RESIN COMPOSITION FOR RADIATION CURING AND PREPREG TOHO TENAX CO LTD (JP) 2011-12-07 EP claimed
WO-2023238836-A1 SILSESQUIOXANE DERIVATIVE AND METHOD FOR PRODUCING SAME, CURABLE COMPOSITION, HARD COAT AGENT, CURED PRODUCT, HARD COAT, AND BASE MATERIAL 東亞合成株式会社 2023-12-14 WO disclosed
EP-3265530-A1 HIGH TEMPERATURE STABLE, LOW OUTGASSING COMPOSITION, PROTECTIVE TAPE COMPRISING SUCH COMPOSITION AND USE OF SUCH TAPE WITH THIN GLASS Corning Incorporated (US) 2018-01-10 EP disclosed
US-8993042-B2 Method for determining the production parameters for a substrate coating process TOYOTA MOTOR ENGINEERING & MANUFACTURING NORTH AMERICA, INC. (US) 2015-03-31 US disclosed
WO-2012037392-A3 FLUID SEAL ASSEMBLY SKF USA INC. (US) 2012-05-10 WO disclosed
EP-1947130-B1 RESIN COMPOSITION FOR RADIATION CURING AND PREPREG TOHO TENAX CO LTD (JP) 2011-12-07 EP disclosed
US-7964248-B2 Dual photoinitiator, photocurable composition, use thereof and process for producing a three dimensional article HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2011-06-21 US disclosed
US-20100327493-A1 DUAL PHOTOINITIATOR, PHOTOCURABLE COMPOSITION, USE THEREOF AND PROCESS FOR PRODUCING A THREE DIMENSIONAL ARTICLE HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2010-12-30 US disclosed
US-7709546-B2 Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate FUJIFILM CORPORATION (JP) 2010-05-04 US disclosed
EP-1505090-B1 REACTIVE DILUENT COMPOSITION AND CURABLE RESIN COMPOSITION NIPPON CATALYTIC CHEM IND (JP) 2010-03-31 EP disclosed
US-20100041803-A1 THERMOSETTING HYPERBRANCHED COMPOSITIONS AND METHODS FOR USE THEREOF DESIGNER MOLECULES, INC. (US) 2010-02-18 US disclosed
EP-1847576-B1 Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate FUJIFILM CORP (JP) 2009-07-08 EP disclosed
EP-1947130-A1 RESIN COMPOSITION FOR RADIATION CURING AND PREPREG Toho Tenax Co., Ltd. (JP) 2008-07-23 EP disclosed
EP-1847576-A1 Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate FUJIFILM Corporation (JP) 2007-10-24 EP disclosed
US-20070242120-A1 Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate FUJIFILM CORPORATION (JP) 2007-10-18 US disclosed
US-20060128822-A1 Composition for holography, method of curing the same, and cured article TOAGOSEI CO., LTD. (JP) 2006-06-15 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100041803-A1 THERMOSETTING HYPERBRANCHED COMPOSITIONS AND METHODS FOR USE THEREOF PAICS, PUF60, PARG TAAR1 1443/4885ALDH1A1 1004/4885ALOX15 1948/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.