SCHEMBL20090060

SCHEMBL20090060

CC(=O)O/N=C(\Cc1cccc(C)c1)C(=O)c1ccc2c(c1)C(CCC1CCCCC1)(CCC1CCCCC1)c1ccccc1-2

nearest known ligand 0.40

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
▸ L3MBTL1 Q9Y468 2/20 0.40
▸ NPC1 O15118 1/20 0.39
▸ MEN1 O00255 1/20 0.35
▸ KMT2A Q03164 1/20 0.35
▸ PDK2 Q15119 5/20 0.33
▸ CTBP2 P56545 1/20 0.33
▸ MAPT P10636 2/20 0.33
▸ ACHE P22303 1/20 0.32
▸ LMNA P02545 2/20 0.32
▸ TP53 P04637 1/20 0.32
▸ PPM1D O15297 1/20 0.31
▸ POLB P06746 1/20 0.31
▸ ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20090058 0.86 CTBP2 (0.39) L3MBTL1NPC1MEN1KMT2APDK2
SCHEMBL20090059 0.86 CTBP2 (0.37) L3MBTL1NPC1KMT2APDK2CTBP2
SCHEMBL20090055 0.86 CTBP2 (0.37) L3MBTL1MEN1KMT2APDK2CTBP2
SCHEMBL20096388 0.85 PDK2 (0.36) L3MBTL1PDK2CTBP2
SCHEMBL20090056 0.85 CTBP2 (0.36) L3MBTL1MEN1KMT2APDK2CTBP2
SCHEMBL20090057 0.83 PDK2 (0.37) L3MBTL1NPC1MEN1KMT2APDK2
SCHEMBL20096531 0.83 CTBP2 (0.35) L3MBTL1PDK2CTBP2
SCHEMBL20090053 0.82 PDK2 (0.34) L3MBTL1PDK2CTBP2
SCHEMBL24490441 0.82 PDK2 (0.35) L3MBTL1MEN1KMT2APDK2MAPT
SCHEMBL24490442 0.81 PDK2 (0.36) L3MBTL1MEN1KMT2APDK2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10416560-B2 Coloring agent dispersion, photosensitive resin composition, cured product, organic el element, method for forming pattern, and method for producing photosensitive resin composition TOKYO OHKA KOGYO CO, LTD. (JP) 2019-09-17 — — US disclosed
US-20180113383-A1 COLORING AGENT DISPERSION, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, ORGANIC EL ELEMENT, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING PHOTOSENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2018-04-26 — — US disclosed
US-20180113383-A1 COLORING AGENT DISPERSION, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, ORGANIC EL ELEMENT, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING PHOTOSENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2018-04-26 — — US disclosed
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