SCHEMBL20090057

SCHEMBL20090057

COC(=O)CCC1(CCC(=O)OC)c2ccccc2-c2ccc(C(=O)/C(Cc3cccc(C)c3)=N/OC(C)=O)cc21

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PDK2 Q15119 4/20 0.37
▸ L3MBTL1 Q9Y468 5/20 0.36
▸ CTBP2 P56545 1/20 0.35
▸ TDP1 Q9NUW8 2/20 0.35
▸ RAB9A P51151 2/20 0.35
▸ APEX1 P27695 1/20 0.34
▸ CSF1R P07333 1/20 0.32
▸ MAOB P27338 1/20 0.32
▸ CYP1A2 P05177 1/20 0.32
▸ CYP3A4 P08684 1/20 0.32
▸ CYP2C9 P11712 1/20 0.32
▸ ACHE P22303 1/20 0.32
▸ ALDH1A1 P00352 3/20 0.31
▸ KMT2A Q03164 3/20 0.31
▸ MEN1 O00255 2/20 0.31
▸ MAPK1 P28482 1/20 0.31
▸ LMNA P02545 1/20 0.31
▸ HTT P42858 1/20 0.31
▸ MAPK8 P45983 1/20 0.31
▸ KDM4E B2RXH2 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20090055 0.90 CTBP2 (0.37) PDK2L3MBTL1CTBP2TDP1RAB9A
SCHEMBL20090056 0.90 CTBP2 (0.36) PDK2L3MBTL1CTBP2TDP1RAB9A
SCHEMBL20090058 0.89 CTBP2 (0.39) PDK2L3MBTL1CTBP2TDP1RAB9A
SCHEMBL20090059 0.89 CTBP2 (0.37) PDK2L3MBTL1CTBP2TDP1RAB9A
SCHEMBL20096531 0.86 CTBP2 (0.35) PDK2L3MBTL1CTBP2TDP1RAB9A
SCHEMBL20096388 0.86 PDK2 (0.36) PDK2L3MBTL1CTBP2MAOB
SCHEMBL20090053 0.83 PDK2 (0.34) PDK2L3MBTL1CTBP2TDP1
SCHEMBL20090060 0.83 L3MBTL1 (0.40) PDK2L3MBTL1CTBP2ACHEALDH1A1
SCHEMBL18123030 0.82 PDK2 (0.35) PDK2APEX1ALDH1A1MAPT
SCHEMBL20090054 0.81 PDK2 (0.33) PDK2L3MBTL1CTBP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10416560-B2 Coloring agent dispersion, photosensitive resin composition, cured product, organic el element, method for forming pattern, and method for producing photosensitive resin composition TOKYO OHKA KOGYO CO, LTD. (JP) 2019-09-17 — — US disclosed
US-20180113383-A1 COLORING AGENT DISPERSION, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, ORGANIC EL ELEMENT, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING PHOTOSENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2018-04-26 — — US disclosed
US-20180113383-A1 COLORING AGENT DISPERSION, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, ORGANIC EL ELEMENT, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING PHOTOSENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2018-04-26 — — US disclosed
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