SCHEMBL20099484

SCHEMBL20099484

CC(C)(C)C(=O)OCc1ccc2c(CC(=O)O)cccc2c1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TDP1 Q9NUW8 1/20 0.49
▸ KDM4E B2RXH2 1/20 0.43
▸ ALDH1A1 P00352 1/20 0.43
▸ GLA P06280 1/20 0.43
▸ AKR1B1 P15121 2/20 0.42
▸ SLC22A12 Q96S37 1/20 0.39
▸ PPARD Q03181 1/20 0.39
▸ ATM Q13315 1/20 0.38
▸ RXRA P19793 1/20 0.38
▸ RXRB P28702 1/20 0.38
▸ FFAR1 O14842 1/20 0.38
▸ CASP1 P29466 2/20 0.37
▸ THRA P10827 1/20 0.37
▸ THRB P10828 1/20 0.37
▸ ENPP2 Q13822 1/20 0.37
▸ MTNR1A P48039 1/20 0.36
▸ MTNR1B P49286 1/20 0.36
▸ CASR P41180 1/20 0.36
▸ CFD P00746 1/20 0.36
▸ PLG P00747 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6948017 0.83 TDP1 (0.55) TDP1AKR1B1SLC22A12PPARDATM
SCHEMBL22279217 0.81 TDP1 (0.48) TDP1AKR1B1SLC22A12PPARDATM
SCHEMBL21783827 0.80 PTGS1 (0.56) TDP1KDM4EALDH1A1AKR1B1SLC22A12
SCHEMBL30496795 0.79 TDP1 (0.66) TDP1KDM4EALDH1A1AKR1B1SLC22A12
SCHEMBL18488099 0.78 KDM4E (0.50) KDM4EALDH1A1GLAAKR1B1THRA
SCHEMBL25005847 0.77 SLC1A3 (0.47) KDM4EALDH1A1GLA
SCHEMBL21585547 0.77 TDP1 (0.62) TDP1KDM4EALDH1A1AKR1B1SLC22A12
SCHEMBL4185211 0.74 CYP3A4 (0.50) KDM4EALDH1A1AKR1B1FFAR1MTNR1A
SCHEMBL15866033 0.74 KDM4E (0.51) TDP1KDM4EALDH1A1GLAAKR1B1
SCHEMBL21585560 0.73 TDP1 (0.66) TDP1ALDH1A1GLAAKR1B1THRA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 — — US disclosed
US-9958776-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-01 — — US disclosed
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