⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20103261 | 0.83 | TSHR (0.38) | — | |
| SCHEMBL16866881 | 0.78 | — | — | |
| SCHEMBL16870590 | 0.77 | — | — | |
| SCHEMBL25121370 | 0.76 | — | — | |
| SCHEMBL942139 | 0.70 | HTT (0.46) | — | |
| SCHEMBL20624824 | 0.70 | MAPK1 (0.33) | — | |
| SCHEMBL16708629 | 0.68 | THRB (0.39) | — | |
| SCHEMBL25780793 | 0.68 | LMNA (0.30) | — | |
| SCHEMBL28848851 | 0.68 | TSHR (0.39) | — | |
| SCHEMBL13744322 | 0.68 | HTT (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-18 | — | — | US | disclosed |
| US-20230314934-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-10-05 | — | — | US | disclosed |
| US-20230213862-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-07-06 | — | — | US | disclosed |
| US-20230104130-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-04-06 | — | — | US | disclosed |
| US-10042259-B2 | Topcoat compositions and pattern-forming methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-08-07 | — | — | US | disclosed |
| US-10042259-B2 | Topcoat compositions and pattern-forming methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-08-07 | — | — | US | disclosed |
| US-20180118968-A1 | TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2018-05-03 | — | — | US | disclosed |
| US-20180118970-A1 | TOPCOAT COMPOSITIONS AND PATTERN-FORMING METHODS | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2018-05-03 | — | — | US | disclosed |
| US-20180118970-A1 | TOPCOAT COMPOSITIONS AND PATTERN-FORMING METHODS | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2018-05-03 | — | — | US | disclosed |
| US-9448486-B2 | Photoresist pattern trimming compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-09-20 | — | — | US | disclosed |
| US-20150185620-A1 | PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2015-07-02 | — | — | US | disclosed |