Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20103248 | 0.83 | — | — | |
| SCHEMBL28848851 | 0.78 | TSHR (0.39) | TSHRALDH1A1THRB | |
| SCHEMBL13451534 | 0.75 | TSHR (0.37) | TSHRALDH1A1THRB | |
| SCHEMBL962842 | 0.74 | TSHR (0.48) | TSHRALDH1A1THRB | |
| SCHEMBL20103259 | 0.73 | TSHR (0.38) | TSHRALDH1A1THRB | |
| SCHEMBL13310695 | 0.73 | TSHR (0.44) | TSHRALDH1A1THRB | |
| SCHEMBL13467163 | 0.72 | TSHR (0.34) | TSHRALDH1A1THRB | |
| SCHEMBL396824 | 0.72 | TSHR (0.50) | TSHRALDH1A1THRB | |
| SCHEMBL51592 | 0.72 | TSHR (0.50) | TSHRALDH1A1THRB | |
| SCHEMBL15337 | 0.72 | TSHR (0.50) | TSHRALDH1A1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240027904-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-25 | — | — | US | disclosed |
| US-20240027905-A1 | PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-25 | — | — | US | disclosed |
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-18 | — | — | US | disclosed |
| US-20230314934-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-10-05 | — | — | US | disclosed |
| US-20230213862-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-07-06 | — | — | US | disclosed |
| US-10042259-B2 | Topcoat compositions and pattern-forming methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-08-07 | — | — | US | disclosed |
| US-10042259-B2 | Topcoat compositions and pattern-forming methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-08-07 | — | — | US | disclosed |
| US-20180118970-A1 | TOPCOAT COMPOSITIONS AND PATTERN-FORMING METHODS | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2018-05-03 | — | — | US | disclosed |
| US-20180118970-A1 | TOPCOAT COMPOSITIONS AND PATTERN-FORMING METHODS | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2018-05-03 | — | — | US | disclosed |
| US-20180118968-A1 | TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2018-05-03 | — | — | US | disclosed |
| US-9448486-B2 | Photoresist pattern trimming compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-09-20 | — | — | US | disclosed |
| US-20160130462-A1 | TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS | ROHM & HAAS ELECT MAT (US) | 2016-05-12 | — | — | US | disclosed |
| US-20150323869-A1 | TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2015-11-12 | — | — | US | disclosed |
| US-9122159-B2 | Compositions and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2015-09-01 | — | — | US | disclosed |
| US-20150185620-A1 | PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2015-07-02 | — | — | US | disclosed |
| US-9063425-B2 | Topcoat compositions and photolithographic methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC. (US) | 2015-06-23 | — | — | US | disclosed |
| US-20130115553-A1 | TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2013-05-09 | — | — | US | disclosed |
| US-20120264053-A1 | COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-10-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | CRY1, CCNT1, CCNA1 | TSHR 3135/4885ALDH1A1 382/4885THRB 3729/4885 |
| US-20230314934-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | CRY1, CBR3, C1S | TSHR 1483/4885ALDH1A1 810/4885THRB 2490/4885 |
| US-20240027904-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | C1S, C1R, CRY2 | TSHR 839/4885ALDH1A1 3079/4885THRB 2348/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.