SCHEMBL20109663

SCHEMBL20109663

COCN1CC(OC(=O)c2ccc(C(C)C)cc2)CN(COC)C1=O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.46
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
LMNA P02545 2/20 0.39
CYP2D6 P10635 1/20 0.39
CYP2C19 P33261 1/20 0.39
SMN1; SMN2 Q16637 4/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
SCN1A P35498 2/20 0.36
SCN2A Q99250 2/20 0.36
SCN3A Q9NY46 2/20 0.36
BCHE P06276 2/20 0.36
ALDH1A1 P00352 1/20 0.36
HTR3E A5X5Y0 1/20 0.36
HTR3B O95264 1/20 0.36
CHRNA7 P36544 1/20 0.36
HTR3A P46098 1/20 0.36
HTR3D Q70Z44 1/20 0.36
HTR3C Q8WXA8 1/20 0.36
NPC1 O15118 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10053065 0.89 NPSR1 (0.36) POLBMEN1KMT2ALMNACYP2D6
SCHEMBL10053069 0.83 POLB (0.34) POLBMEN1KMT2ACYP2D6SMN1; SMN2
SCHEMBL17936646 0.83 SERPINE1 (0.38) POLBMEN1KMT2ACYP2D6CYP2C19
SCHEMBL18100878 0.82 SMN1; SMN2 (0.38) MEN1KMT2ALMNACYP2D6CYP2C19
SCHEMBL471779 0.81 SMN1; SMN2 (0.38) MEN1KMT2ALMNACYP2D6CYP2C19
SCHEMBL10053067 0.81 CYP2D6 (0.34) POLBKMT2ACYP2D6ALDH1A1
SCHEMBL17936648 0.81 ALDH1A1 (0.44) MEN1KMT2AL3MBTL1ALDH1A1HTR3E
SCHEMBL19901945 0.80 POLB (0.33) POLBKMT2ACYP2D6
SCHEMBL10053077 0.80 CYP2D6 (0.33) POLBKMT2ACYP2D6ALDH1A1
SCHEMBL10053074 0.80 CYP2D6 (0.33) POLBKMT2ACYP2D6ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10928727-B2 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing FUJIFILM CORPORATION (JP) 2021-02-23 US disclosed
US-20180120701-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed