SCHEMBL19901945

SCHEMBL19901945

COCN1CC(OC(=O)c2ccc3ccc(C(CC(C)C)C(C)C)cc3c2)CN(COC)C1=O

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.33
CYP2D6 P10635 2/20 0.32
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10053069 0.85 POLB (0.34) POLBCYP2D6KMT2A
SCHEMBL10053077 0.83 CYP2D6 (0.33) POLBCYP2D6KMT2A
SCHEMBL10053074 0.83 CYP2D6 (0.33) POLBCYP2D6KMT2A
SCHEMBL19901978 0.83 HTR3E (0.33)
SCHEMBL10053067 0.82 CYP2D6 (0.34) POLBCYP2D6KMT2A
SCHEMBL20109663 0.80 POLB (0.46) POLBCYP2D6KMT2A
SCHEMBL19901944 0.80 HTR3E (0.38)
SCHEMBL19901949 0.78 RAB9A (0.40) POLBKMT2A
SCHEMBL10021856 0.77 CYP2D6 (0.32) CYP2D6KMT2A
SCHEMBL10053065 0.75 NPSR1 (0.36) POLBCYP2D6KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9904168-B2 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2018-02-27 US disclosed