SCHEMBL20109916

SCHEMBL20109916

Cc1cccc(CCC(C)c2cc(C(C)C)cc(C(C)C)c2C(=O)O)c1C(=O)O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FABP3 P05413 2/20 0.54
FABP4 P15090 2/20 0.54
LDHA P00338 1/20 0.36
LDHB P07195 1/20 0.36
SLC22A12 Q96S37 1/20 0.34
BID P55957 3/20 0.33
MCL1 Q07820 3/20 0.33
BCL2L1 Q07817 2/20 0.33
BAK1 Q16611 2/20 0.33
KAT8 Q9H7Z6 2/20 0.33
FABP5 Q01469 1/20 0.33
NOTUM Q6P988 1/20 0.33
PPARG P37231 1/20 0.33
PPARA Q07869 1/20 0.33
EP300 Q09472 1/20 0.33
KAT2A Q92830 1/20 0.33
KAT2B Q92831 1/20 0.33
KAT5 Q92993 1/20 0.33
SAE1 Q9UBE0 1/20 0.33
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1108967 0.77 L3MBTL1 (0.42) LDHALDHBBIDMCL1BCL2L1
SCHEMBL18720033 0.74 FABP3 (0.59) FABP3FABP4LDHALDHBFABP5
SCHEMBL810177 0.73 FABP3 (1.00) FABP3FABP4LDHALDHBFABP5
SCHEMBL17311830 0.72 FABP3 (0.96) FABP3FABP4LDHALDHBFABP5
SCHEMBL30179912 0.70 FOLH1 (0.40) BIDMCL1BCL2L1BAK1KAT8
SCHEMBL5164770 0.69 BID (0.53) LDHALDHBBIDMCL1BCL2L1
SCHEMBL6235887 0.69 TDP1 (0.49) FABP3FABP4LDHANOTUMTDP1
SCHEMBL20274264 0.68 FABP3 (0.72) FABP3FABP4LDHALDHBFABP5
SCHEMBL18826742 0.68 FABP3 (0.52) FABP3FABP4FABP5
SCHEMBL5693066 0.67 L3MBTL1 (0.47) BIDMCL1BCL2L1BAK1KAT8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10928727-B2 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing FUJIFILM CORPORATION (JP) 2021-02-23 US disclosed
US-20180120701-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed