SCHEMBL20137003

SCHEMBL20137003

Cc1cc(C)c(Cc2ccc(O)cc2)cc1C

nearest known ligand 0.59

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 5/20 0.52
ESR2 Q92731 5/20 0.52
KEAP1 Q14145 1/20 0.48
MEN1 O00255 1/20 0.43
MAPT P10636 1/20 0.43
KMT2A Q03164 1/20 0.43
THRA P10827 1/20 0.41
THRB P10828 1/20 0.41
ALOX5 P09917 1/20 0.41
IDH1 O75874 1/20 0.41
TMEM97 Q5BJF2 1/20 0.41
SIGMAR1 Q99720 1/20 0.41
LDHA P00338 1/20 0.40
LDHB P07195 1/20 0.40
RXRA P19793 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20044908 0.94 ESR1 (0.54) ESR1ESR2KEAP1MEN1MAPT
SCHEMBL22647746 0.92 ESR1 (0.52) ESR1ESR2KEAP1MEN1MAPT
SCHEMBL28158802 0.88 KEAP1 (0.50) ESR1ESR2KEAP1MEN1MAPT
SCHEMBL4058622 0.86 KEAP1 (0.52) ESR1ESR2KEAP1MEN1MAPT
SCHEMBL14564525 0.84 KEAP1 (0.50) ESR1ESR2KEAP1MEN1MAPT
SCHEMBL11200939 0.83 ESR2 (0.52) ESR1ESR2KEAP1MEN1MAPT
SCHEMBL278271 0.80 MAPT (0.50) ESR1ESR2KEAP1MEN1MAPT
SCHEMBL7566966 0.80 ESR1 (0.48) ESR1ESR2KEAP1MEN1MAPT
SCHEMBL28680998 0.80 ESR1 (0.48) ESR1ESR2KEAP1MEN1MAPT
SCHEMBL4247392 0.79 ESR1 (0.46) ESR1ESR2KEAP1MEN1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107849167-B Method for producing polymer for electronic material and polymer for electronic material obtained by the production method 丸善石油化学株式会社 2021-02-23 CN disclosed
US-10766973-B2 Method for producing polymer for electronic material and polymer for electronic material obtained by the production method MARUZEN PETROCHEMICAL CO., LTD. (JP) 2020-09-08 US disclosed
CN-104541205-B Resist underlayer film forming composition containing novolac resin having polynuclear phenol 日产化学工业株式会社 2019-07-05 CN disclosed
US-20180134819-A1 METHOD FOR PRODUCING POLYMER FOR ELECTRONIC MATERIAL AND POLYMER FOR ELECTRONIC MATERIAL OBTAINED BY THE PRODUCTION METHOD MARUZEN PETROCHEMICAL CO., LTD. (JP) 2018-05-17 US disclosed
CN-104541205-A Resist underlayer film forming composition containing novolac resin having polynuclear phenol NISSAN CHEMICAL IND LTD 2015-04-22 CN disclosed