SCHEMBL20164940

SCHEMBL20164940

COc1ccc(S(=O)(=O)ON=C(c2ccccc2)C(F)(F)F)cc1.O=S(=O)(ON=C(c1ccccc1)C(F)(F)F)c1cccc2ccccc12

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TUBB4A P04350 3/20 0.41
TUBB P07437 3/20 0.41
TUBA3C P0DPH7 3/20 0.41
TUBA1B P68363 3/20 0.41
TUBA4A P68366 3/20 0.41
TUBB4B P68371 3/20 0.41
TUBB3 Q13509 3/20 0.41
TUBB2A Q13885 3/20 0.41
TUBB8 Q3ZCM7 3/20 0.41
TUBA3E Q6PEY2 3/20 0.41
TUBA1A Q71U36 3/20 0.41
TUBA1C Q9BQE3 3/20 0.41
TUBB6 Q9BUF5 3/20 0.41
TUBB2B Q9BVA1 3/20 0.41
TUBB1 Q9H4B7 3/20 0.41
LMNA P02545 2/20 0.39
HTT P42858 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20164939 1.00 TUBB4A (0.41) TUBB4ATUBBTUBA3CTUBA1BTUBA4A
SCHEMBL30098742 0.88 F2 (0.41) F2PRSS1PRSS2PRSS3KMT2A
SCHEMBL546738 0.88 F2 (0.41) F2PRSS1PRSS2PRSS3KMT2A
SCHEMBL384504 0.88 F2 (0.41) F2PRSS1PRSS2PRSS3KMT2A
SCHEMBL546375 0.88 GAA (0.44) TUBB4ATUBBTUBA3CTUBA1BTUBA4A
SCHEMBL383221 0.88 GAA (0.44) TUBB4ATUBBTUBA3CTUBA1BTUBA4A
SCHEMBL546201 0.82 EP300 (0.45) LMNAHTTSMN1; SMN2TDP1L3MBTL1
SCHEMBL546200 0.82 EP300 (0.45) LMNAHTTSMN1; SMN2TDP1L3MBTL1
SCHEMBL4901088 0.79 F2 (0.37) F2PRSS1PRSS2PRSS3KMT2A
SCHEMBL546915 0.78 ALDH1A1 (0.49) LMNAHTTTDP1GAANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180143535-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST FILM LAMINATE AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-24 US disclosed