SCHEMBL20171522

SCHEMBL20171522

Cc1ccc(SCSc2ccc(C)cc2C)c(C)c1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.45
HAO1 Q9UJM8 1/20 0.42
SMN1; SMN2 Q16637 3/20 0.41
NPC1 O15118 3/20 0.41
RAB9A P51151 3/20 0.41
L3MBTL1 Q9Y468 2/20 0.41
TDP1 Q9NUW8 2/20 0.41
TP53 P04637 2/20 0.41
POLB P06746 2/20 0.39
HPGD P15428 2/20 0.38
PKM P14618 1/20 0.38
HTR1A P08908 4/20 0.38
HTR3A P46098 4/20 0.38
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
ALDH1A1 P00352 1/20 0.38
APEX1 P27695 1/20 0.38
RECQL P46063 1/20 0.38
GAA P10253 1/20 0.37
MAPT P10636 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9515924 0.86 LMNA (0.45) LMNAHAO1SMN1; SMN2NPC1RAB9A
SCHEMBL14564993 0.84 LMNA (0.44) LMNAHAO1SMN1; SMN2NPC1RAB9A
SCHEMBL10859248 0.82 LMNA (0.46) LMNAHAO1SMN1; SMN2NPC1RAB9A
SCHEMBL24548502 0.80 LMNA (0.42) LMNAHAO1SMN1; SMN2NPC1RAB9A
SCHEMBL11163658 0.80 TAAR1 (0.44) LMNAHAO1SMN1; SMN2NPC1RAB9A
SCHEMBL7691152 0.79 LMNA (0.47) LMNAHAO1SMN1; SMN2NPC1RAB9A
SCHEMBL10856259 0.79 LMNA (0.41) LMNAHAO1SMN1; SMN2NPC1RAB9A
SCHEMBL29411684 0.77 NPC1 (0.50) LMNAHAO1SMN1; SMN2NPC1RAB9A
SCHEMBL76793 0.77 HAO1 (0.55) LMNAHAO1SMN1; SMN2TDP1TP53
SCHEMBL29475022 0.77 HAO1 (0.55) LMNAHAO1SMN1; SMN2TDP1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1566693-B1 Use of a Resist Composition for Immersion Exposure and Pattern Formation Method Using the Composition FUJIFILM CORP (JP) 2018-05-23 EP disclosed