SCHEMBL20171541

SCHEMBL20171541

CC(C)(C)C(C)(C)C(=O)OC1CCCCO1

nearest known ligand 0.36

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
SLC6A3 Q01959 2/20 0.31
EPHX2 P34913 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10098359 0.86 MEN1 (0.34) MEN1KMT2ASLC6A3
SCHEMBL12395034 0.85 MEN1 (0.35) MEN1KMT2ASLC6A3
SCHEMBL8979423 0.84 MEN1 (0.35) MEN1KMT2ASLC6A3
SCHEMBL15699350 0.82 MEN1 (0.34) MEN1KMT2ASLC6A3
SCHEMBL12378376 0.82 MEN1 (0.34) MEN1KMT2ASLC6A3
SCHEMBL15699343 0.81 CFTR (0.31) KMT2A
SCHEMBL10098332 0.80 KMT2A (0.32) KMT2A
SCHEMBL15699342 0.79 KMT2A (0.33) MEN1KMT2A
SCHEMBL785892 0.79 FKBP1A (0.37) MEN1KMT2A
SCHEMBL12941461 0.79 MEN1 (0.33) MEN1KMT2ASLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1566693-B1 Use of a Resist Composition for Immersion Exposure and Pattern Formation Method Using the Composition FUJIFILM CORP (JP) 2018-05-23 EP disclosed