Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FKBP1A | P62942 | 6/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | HMGCR | P04035 | 2/20 | 0.34 |
| ▸ | CCR2 | P41597 | 1/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL785974 | 0.95 | FKBP1A (0.35) | FKBP1AMEN1KMT2AHMGCR | |
| SCHEMBL8979439 | 0.85 | MEN1 (0.35) | FKBP1AMEN1KMT2AEPHX1 | |
| SCHEMBL15697297 | 0.85 | MEN1 (0.35) | FKBP1AMEN1KMT2AEPHX1 | |
| SCHEMBL16282561 | 0.85 | HMGCR (0.33) | FKBP1AMEN1KMT2AHMGCREPHX1 | |
| SCHEMBL2734976 | 0.85 | HMGCR (0.36) | FKBP1AMEN1KMT2AHMGCR | |
| SCHEMBL6747979 | 0.84 | NAAA (0.36) | MEN1KMT2ACCR2 | |
| SCHEMBL16282546 | 0.84 | HMGCR (0.33) | FKBP1AMEN1KMT2AHMGCRCCR2 | |
| SCHEMBL26650279 | 0.83 | KMT2A (0.34) | MEN1KMT2A | |
| SCHEMBL12395034 | 0.82 | MEN1 (0.35) | MEN1KMT2A | |
| SCHEMBL10214225 | 0.82 | FKBP1A (0.31) | FKBP1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 137 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230242467-A1 | HIGH PURITY 4-HYDROXYSTYRENE SOLUTION, METHOD OF PRODUCING THE SAME, AND METHOD OF PRODUCING 4-HYDROXYSTYRENE POLYMER | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| US-11662663-B2 | Substrate protective film-forming composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-30 | — | — | US | disclosed |
| US-20180194930-A1 | COMPOSITION CONTAINING MICROPARTICLES | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-07-12 | — | — | US | disclosed |
| US-20180196178-A1 | RESIN FILM, COLORING PHOTOSENSITIVE COMPOSITION, RESIN FILM PRODUCTION METHOD, COLOR FILTER, LIGHT SHIELDING FILM, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2018-07-12 | — | — | US | disclosed |
| US-9994538-B2 | Latent acids and their use | BASF SE (DE) | 2018-06-12 | — | — | US | disclosed |
| US-9994685-B2 | Resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-06-12 | — | — | US | disclosed |
| US-20180087010-A1 | PRE-RINSING LIQUID, PRE-RINSING TREATMENT METHOD, AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2018-03-29 | — | — | US | disclosed |
| US-9929376-B2 | Laminate, kit for manufacturing organic semiconductor, and resist composition for manufacturing organic semiconductor | FUJIFILM CORPORATION (JP) | 2018-03-27 | — | — | US | disclosed |
| US-20180009775-A1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2018-01-11 | — | — | US | disclosed |
| US-9829796-B2 | Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device | FUJIFILM CORPORATION (JP) | 2017-11-28 | — | — | US | disclosed |
| US-20070141513-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-06-21 | — | — | US | disclosed |
| US-20070141513-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-06-21 | — | — | US | disclosed |
| US-7226721-B2 | Underlayer coating forming composition for lithography containing compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-06-05 | — | — | US | disclosed |
| US-7214467-B2 | Photosensitive resin composition | FUJIFILM CORPORATION (JP) | 2007-05-08 | — | — | US | disclosed |
| US-7202015-B2 | Positive photoresist composition and pattern making method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-04-10 | — | — | US | disclosed |
| US-7192681-B2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| US-20070042290-A1 | resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits | FUJI PHOTO FILM CO., LTD. | 2007-02-22 | — | — | US | disclosed |
| US-7163776-B2 | Positive-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
| US-7160666-B2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-09 | — | — | US | disclosed |
| US-20070003871-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-01-04 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180009775-A1 | LATENT ACIDS AND THEIR USE | LTA, C1S, C9 | FKBP1A 1631/4885MEN1 4625/4885KMT2A 2445/4885 |
| US-20180194930-A1 | COMPOSITION CONTAINING MICROPARTICLES | CHMP4B, EXOSC10, EXOSC9 | FKBP1A 1586/4885MEN1 200/4885KMT2A 3532/4885 |
| US-20230242467-A1 | HIGH PURITY 4-HYDROXYSTYRENE SOLUTION, METHOD OF PRODUCING THE SAME, AND METHOD OF PRODUCING 4-HYDROXYSTYRENE POLYMER | HAAO, HPD, IL4 | FKBP1A 4228/4885MEN1 3062/4885KMT2A 2116/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.