SCHEMBL201965

SCHEMBL201965

NCCC1CCCCC1CCN

nearest known ligand 0.55

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 1/20 0.40
NOS3 P29474 1/20 0.38
NOS1 P29475 1/20 0.38
NOS2 P35228 1/20 0.38
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
CA4 P22748 1/20 0.35
EPHX1 P07099 1/20 0.33
THRB P10828 1/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
TP53 P04637 1/20 0.31
GRIN2D O15399 3/20 0.31
GRIN3B O60391 3/20 0.31
GRIN1 Q05586 3/20 0.31
GRIN2A Q12879 3/20 0.31
GRIN2B Q13224 3/20 0.31
GRIN2C Q14957 3/20 0.31
GRIN3A Q8TCU5 3/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21034603 0.94 SIGMAR1 (0.37) SIGMAR1NOS3NOS1NOS2CA1
SCHEMBL14236535 0.87 CA1 (0.54) SIGMAR1NOS3NOS1NOS2CA1
SCHEMBL7720524 0.86 SIGMAR1 (0.32) SIGMAR1NOS3NOS1NOS2
SCHEMBL22210560 0.84 SIGMAR1 (0.37) SIGMAR1NOS3NOS1NOS2CA1
SCHEMBL22178631 0.84 CA1 (0.52) SIGMAR1NOS3NOS1NOS2CA1
SCHEMBL25159164 0.84 SIGMAR1 (0.37) SIGMAR1NOS3NOS1NOS2CA1
SCHEMBL22036804 0.84 SIGMAR1 (0.37) SIGMAR1NOS3NOS1NOS2CA1
SCHEMBL19646984 0.84 CA1 (0.52) SIGMAR1NOS3NOS1NOS2CA1
SCHEMBL13495042 0.83 THRB (0.45) SIGMAR1NOS3NOS1NOS2CA1
SCHEMBL1615265 0.81 SIGMAR1 (0.48) SIGMAR1NOS3NOS1NOS2CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 120 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119673750-A Selective deposition of organic polymeric materials and deposition assemblies ASM IP私人控股有限公司 2025-03-21 CN claimed
US-20250092509-A1 SELECTIVE DEPOSITION OF ORGANIC POLYMER MATERIAL AND DEPOSITION ASSEMBLIES ASM IP HOLDING B.V. (NL) 2025-03-20 US claimed
US-20250137118-A1 POLYMERIC INHIBITOR FOR AREA SELECTIVE DEPOSITION ASM IP HOLDING B.V. (NL) 2025-05-01 US disclosed
WO-2025074873-A1 POLYAMIDIMIDE, RESIN COMPOSITION, MOLDED ARTICLE, AND FILM 株式会社カネカ 2025-04-10 WO disclosed
WO-2025063230-A1 POLYIMIDE, RESIN COMPOSITION, MOLDED OBJECT, AND FILM 株式会社カネカ 2025-03-27 WO disclosed
CN-119673750-A Selective deposition of organic polymeric materials and deposition assemblies ASM IP私人控股有限公司 2025-03-21 CN disclosed
US-20250092509-A1 SELECTIVE DEPOSITION OF ORGANIC POLYMER MATERIAL AND DEPOSITION ASSEMBLIES ASM IP HOLDING B.V. (NL) 2025-03-20 US disclosed
US-12234323-B2 Transparent polyimide film and production method therefor KANEKA CORPORATION (JP) 2025-02-25 US disclosed
CN-116354864-B Diamine containing intramolecular imide ring and aliphatic alkyl group, polyimide formed based on diamine, preparation method and application thereof 天津科技大学 2024-12-13 CN disclosed
CN-117279780-B Laminated substrate, laminated body manufacturing method, laminated body with member for electronic device, and electronic device manufacturing method AGC株式会社 2024-08-16 CN disclosed
US-20240199878-A1 RESIN COMPOSITION, FORMED ARTICLE AND FILM KANEKA CORPORATION (JP) 2024-06-20 US disclosed
EP-1237015-A1 OPTICAL MEMBERS MADE OF POLYIMIDE RESINS Mitsui Chemicals, Inc. (JP) 2002-09-04 EP disclosed
EP-1225192-A1 POLYIMIDES AND POLYAMIC ACIDS Mitsui Chemicals, Inc. (JP) 2002-07-24 EP disclosed
EP-1216233-A1 QUINAZOLINONES MERCK PATENT GmbH (DE) 2002-06-26 EP disclosed
EP-1148078-A1 POLYIMIDE CONTAINING CROSSLINKABLE GROUP AND PROCESS FOR PRODUCING THE SAME Mitsui Chemicals, Inc. (JP) 2001-10-24 EP disclosed
WO-2001023364-A1 QUINAZOLINONES MERCK PATENT GMBH (DE) 2001-04-05 WO disclosed
EP-0200463-B1 COATING COMPOSITIONS FOR USE IN THE PRODUCTION OF LIGHT-SENSITIVE REPRODUCTION MATERIALS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1989-08-02 EP disclosed
US-4683190-A AMINES, PHOTORESISTS E. I. DU PONT DE NEMOURS AND COMPANY (US) 1987-07-28 US disclosed
EP-0200463-A2 Coating compositions for use in the production of light-sensitive reproduction materials E.I. DU PONT DE NEMOURS AND COMPANY (US) 1986-11-05 EP disclosed
US-3950310-A FIBERS, MOLDING MATERIALS EXXON RESEARCH & ENGINEERING CO. (US) 1976-04-13 US disclosed